Nanoscale Multi-Layer Thin Film Fabricated by Cathodic Arc Evaporation (CAE) Method

Mass‐to‐charge ion composition of plasma in a magnetron discharge with reactive sputtering of titanium target

“…[1][2][3] The use of chemically active nitrogen or oxygen as a working gas in the vacuum chamber allows the synthesis of various nitride [4,5] or oxide coatings [6,7] and their mixtures. [8,9] Thin-film coatings based on titanium nitride are characterized by high wear resistance, [10] high corrosion resistance, [11] high evaporation temperature, chemical stability, [12] and other crucial characteristics, [13] leading to the wide application of these coatings in microelectronics, [14] optics, [15] and other industries. Titanium dioxide is an important coating material, providing protection to the underlying substrate from undesirable effects of aggressive media or irradiation by electrons and ions [16][17][18][19] on structural materials.…”

“…With their good chemical resistance [12] and excellent optical [20] and photocatalytic properties, [19] titanium dioxide-based coatings are widely used in modern materials science. Titanium oxide and nitride coatings can be obtained using various methods, including the deposition from vacuum arc plasma, [5,6,10,10,13,21] pulsed laser ablation, [8] and the sol-gel method. [21] Another common method for obtaining such coatings is magnetron sputtering.…”