2020
DOI: 10.1021/acsphotonics.0c00951
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Nanoscale Spectroscopy of Dielectric Properties of Mica

Abstract: Infrared dielectric properties of muscovite mica, one of the first van der Waals crystals, exfoliated on silicon and SiO 2 substrates is studied using near-field nano-FTIR spectroscopy. The spectra of mica show strong thickness and wavelength dependence down to the monolayer-scale, with a prominent broad peak centered around ∼1080 cm −1 assigned to stretching vibrations of Si−O. We reveal that the infrared dielectric permittivity of mica is anisotropic, that is, has opposite signs along the inplane and out-of-… Show more

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Cited by 22 publications
(15 citation statements)
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“…Dark excitons can be visualized using TEPL for TMD samples on metallic substrates because the electric field strength perpendicular to the sample surface is drastically enhanced 12 , 19 . In contrast, the s-SNOM signal for atomically thin TMDs is governed by the in-plane dielectric function 32 , 44 , which arises from bright excitons (see SOM). To experimentally confirm the dominant role of bright excitons in our data, we compared the bright exciton resonance energy obtained from far-field PL spectra on the same sample 45 with the resonance energy in our s-SNOM spectra.…”
Section: Resultsmentioning
confidence: 99%
“…Dark excitons can be visualized using TEPL for TMD samples on metallic substrates because the electric field strength perpendicular to the sample surface is drastically enhanced 12 , 19 . In contrast, the s-SNOM signal for atomically thin TMDs is governed by the in-plane dielectric function 32 , 44 , which arises from bright excitons (see SOM). To experimentally confirm the dominant role of bright excitons in our data, we compared the bright exciton resonance energy obtained from far-field PL spectra on the same sample 45 with the resonance energy in our s-SNOM spectra.…”
Section: Resultsmentioning
confidence: 99%
“…To replicate the large near-field amplitudes extracted from the finite element analysis, we choose L = 600 nm as the best value in the FDM. Larger values for L are incompatible with the requirement that L ≪ λ. , With these parameters, we find an optimal value of g = 0.98 e 0.14 i for a doped Si substrate with a dopant concentration in the range of 1 × 10 18 cm –3 to 1 × 10 21 cm –3 .…”
Section: Methodsmentioning
confidence: 79%
“…In order to quantitatively assess the local conductivity modulation of the charge writing process, we performed scattering type canning near-field microscopy (s-SNOM) imaging of the patterned area of the sample. S-SNOM enables imaging local conductivity changes with high-sensitivity and high-spatial resolution, limited only by the sharpness of the probe tip (see "Methods") [36][37][38][39] . The resulting s-SNOM amplitude images shown in Fig.…”
Section: Resultsmentioning
confidence: 99%