2013
DOI: 10.1117/2.1201310.005154
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Nanosphere lithography for device fabrication

Abstract: An inexpensive and scalable technique enables tailoring of nanopatterns and nanostructures on solid surfaces.

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Cited by 1 publication
(5 citation statements)
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“…9 for small inter-particle distances reaches ~ 40 nm at the maximum, being comparable to the results of Lindner et al [11] and Nagy et al [7].…”
Section: Accepted M Manuscriptsupporting
confidence: 90%
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“…9 for small inter-particle distances reaches ~ 40 nm at the maximum, being comparable to the results of Lindner et al [11] and Nagy et al [7].…”
Section: Accepted M Manuscriptsupporting
confidence: 90%
“…The ion irradiation of a nanoparticulate mask causes the reorganization of particles with different features of the process for low, medium and high ion fluences [16,17]. In this paper we show that the reorganization process also depends on the particle size.…”
Section: Accepted M Manuscriptmentioning
confidence: 62%
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