2015
DOI: 10.1016/j.matdes.2015.07.081
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Nanostructured copper and copper oxide thin films fabricated by hydrothermal treatment of copper hydroxide nitrate

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Cited by 34 publications
(9 citation statements)
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“…According to the Cu 2p 3/2 binding energies given in the literature [36,37], the following three copper species can be identified on the surface of the samples: Cu 2 S (932.20 eV), CuO (933.60 eV), and CuS (935.00 eV). The CuO may be formed through the dehydration of the adsorbed copper hydroxide during the vacuum-drying process [38]. The Cu 2 S is generated via the reduction of CuS, according to the results of previous research [39].…”
Section: Surface Copper Analysismentioning
confidence: 77%
“…According to the Cu 2p 3/2 binding energies given in the literature [36,37], the following three copper species can be identified on the surface of the samples: Cu 2 S (932.20 eV), CuO (933.60 eV), and CuS (935.00 eV). The CuO may be formed through the dehydration of the adsorbed copper hydroxide during the vacuum-drying process [38]. The Cu 2 S is generated via the reduction of CuS, according to the results of previous research [39].…”
Section: Surface Copper Analysismentioning
confidence: 77%
“…Cu is an important metallic material due to its excellent electrical conductivity, only second to silver but more abundant and affordable. Therefore, thin films of metallic Cu have been identified as promising conductive materials and extensively used in microelectronics [1]. Leading techniques, such as radio-frequency sputtering [2] and chemical vapor deposition [3], have been found to be capable of depositing Cu thin films of good quality.…”
Section: Introductionmentioning
confidence: 99%
“…There are different preparations, which were considered, including wet and dry methods were used for the deposition of metal/semiconductor thin films. These methods, such as atomic layer deposition (ALD), photochemical deposition [11], physical vapour deposition (PVD) [12], in addition to molecular precursor [13], ion beam-assisted deposition (IBAD) [14] and hydrothermal methods [15] were applied. When the same thin film is deposited by different techniques, these techniques give the film with different phase structures, degree of crystallinity and variable optoelectronic properties.…”
Section: Introductionmentioning
confidence: 99%