Controlling the intensity of surface-enhanced
Raman spectroscopy
(SERS) in a systematic manner is the key to understanding, and even
predicting, the dynamics of the imposing phenomenon. It has been known
that the SERS signal is intensified by resonant electron oscillation
at the hot spots. To date, few of the reported SERS techniques are
capable of confining the contributive charges with a controlled concentration
and position. Here, we systematically increase the carrier population
a few nanometers below the hot spots, aiming to quantify the dependence
of SERS intensity on surface charge concentration. The work is accomplished
by InGaN quantum wells (QWs) grown by metal–organic chemical
vapor deposition (MOCVD). Characterizing the QW wafers with capacitance–voltage
curves and the correspondent Raman spectra, we observe a linear logarithmic
dependence of SERS intensity on the electron concentration. The intensity
is further boosted by nanostructuring the QW surface with adjusted
MOCVD conditions.