“…The increase in demand for these nanostructures is mainly attributed to their unique electrical, optical, magnetic, thermal, mechanical and chemical properties [5,9]. Several fabrication methods including electrochemical deposition [10], electroless deposition [11], sol-gel [12], chemical vapour deposition (CVD) [13,14], and atomic layer deposition (ALD) [15] have been utilized to deposit 1D carbon [13,14], metal [15], oxide [12], semiconducting [12], polymer [10], and hybrid [11] nanostructures. However, the CVD and ALD processes require high deposition temperatures, typically ranging between 500 °C and 900 °C.…”