2007
DOI: 10.1016/j.surfcoat.2007.05.065
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Nanostructured SiC by chemical vapor deposition and nanoparticle impaction

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Cited by 11 publications
(6 citation statements)
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“…For the CVD SiC coating, the atom ratio of the silicon to carbon is close to 1, and the content of carbon is slightly larger than that of silicon, which indicates that the CVD SiC coating is carbon excess. In addition, the existence of some oxygen in the CVD SiC coating shows that the oxidation of silicon occurs during the SiC deposition, as already observed by Beaber et al in CVD SiC films [22].…”
Section: Methodssupporting
confidence: 67%
“…For the CVD SiC coating, the atom ratio of the silicon to carbon is close to 1, and the content of carbon is slightly larger than that of silicon, which indicates that the CVD SiC coating is carbon excess. In addition, the existence of some oxygen in the CVD SiC coating shows that the oxidation of silicon occurs during the SiC deposition, as already observed by Beaber et al in CVD SiC films [22].…”
Section: Methodssupporting
confidence: 67%
“…In these processes, the dry nanopowders available from different physical and chemical methods (e.g. inert gas condensation [64], chemical vapor deposition [65,66], physical vapor deposition [67] or mechanical alloying [68]) are dispersed into a base fluid [69][70][71][72]. Currently, the two-step approach is the cheaper method for large scale production of nanofluids, since nanopowder synthesis techniques have already been scaled up to industrial production levels.…”
Section: Nanofluid Synthesismentioning
confidence: 99%
“…Details of the VLS growth process are described elsewhere (Sivakov et al 2006). The Si nanotowers were then coated with nanocrystalline 3C-SiC using hypersonic plasma particle deposition (HPPD) (Beaber et al 2007). HPPD is a thermal plasma based deposition technique that combines nanoparticle ballistic impaction and chemical vapor deposition (CVD).…”
Section: Methodsmentioning
confidence: 99%