Nanostructured TiO2 films: Enhanced NH3 detection at room temperature

Dhivya, P.; Prasad, Arun K.; Sridharan, M.

doi:10.1016/j.ceramint.2013.06.016

Cited by 74 publications

(21 citation statements)

References 35 publications

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“…Titanium dioxide (TiO 2 ) thin films play a significant role in different areas of research and may lead to promising applications, due to its very good optical and electrical properties, high chemical stability and non-toxic nature. Over the years, TiO 2 has been studied for many potential applications, including as a coating for self-cleaning surfaces, the white pigment in paints and food coloring, solar cells [1], biomaterials applications [2,3], as a material for corrosion resistance [4][5][6][7][8][9][10], and gas sensing [11,12]. TiO 2 can be deposited through various methods [13] such as chemical vapor deposition (CVD), pulsed laser deposition (PLD), electrophoretic deposition (EPD), magnetron sputtering (MS), and sol-gel dip-coating.…”

Section: Introductionmentioning

confidence: 99%

RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate

et al. 2019

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Rutile titanium oxide (TiO 2 ) thin films require more energy to crystallize than the anatase phase of TiO 2 . It is a prime candidate for micro-optoelectronics and is usually obtained either by high substrate temperature, applying a substrate bias, pulsed gas flow to modify the pressure, or ex situ annealing. In the present work, we managed to obtain high enough energy at the substrate in order for the particles to form rutile TiO 2 at room temperature without any intentional substrate bias in a continuous gas flow. The rutile TiO 2 thin films were deposited by a reactive radiofrequency magnetron sputtering system from a titanium target, in an argon/oxygen gas mixture. Investigations regarding the film's structure and morphology were performed by X-ray diffraction (XRD), X-ray reflectivity (XRR), scanning electron microscopy (SEM) and energy-dispersive X-ray spectroscopy (EDAX), while the optical properties were investigated by means of ellipsometry.

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Section: Introductionmentioning

confidence: 99%

RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate

et al. 2019

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“…Additionally, UV-assisted chemical sensing opens up the intriguing potential of gas detection at room-temperature for sensors based on wide-bandgap oxides [1, 15-17]. The advantages associated with room-temperature operation are low-power consumption and longer sensor life-time, as well as safe operation in explosive environments [18]. Moreover, room-temperature operation enables the integration of chemical sensors with Si-based integrated circuits and the complete elimination of heating elements.…”

Section: Introductionmentioning

confidence: 99%

UV-assisted room-temperature chemiresistive NO2 sensor based on TiO2 thin film

Xie

Sullivan

Steffens

et al. 2015

Journal of Alloys and Compounds

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TiO2 thin film based, chemiresistive sensors for NO2 gas which operate at room temperature under ultraviolet (UV) illumination have been demonstrated in this work. The rf-sputter deposited and post-annealed TiO2 thin films have been characterized by atomic force microscopy, X-ray photoelectron spectroscopy, and X-ray diffraction to obtain surface morphology, chemical state, and crystal structure, respectively. UV-vis absorption spectroscopy and Tauc plots show the optical properties of the TiO2 films. Under UV illumination, the NO2 sensing performance of the TiO2 films shows a reversible change in resistance at room-temperature. The observed change in electrical resistivity can be explained by the modulation of surface-adsorbed oxygen. This work is the first demonstration of a facile TiO2 sensor for NO2 analyte that operates at room-temperature under UV illumination.

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“…16 The schematic diagram of the deposition chamber has been reported earlier. 17 Prior to the deposition, the chamber was evacuated to the base pressure of 1 9 10 À5 mbar with the help of an oil diffusion pump backed with a rotary pump. Argon (Ar) and oxygen (O 2 ) were used as sputtering and reactive gases, respectively.…”

Section: Experimental Methodsmentioning

confidence: 99%

Porous Anatase TiO2 Thin Films for NH3 Vapour Sensing

Ponnusamy

Sridharan

2015

Journal of Elec Materi

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Anatase titanium dioxide (TiO 2 ) thin films were deposited onto cleaned glass substrates by a direct current (DC) reactive magnetron sputtering technique for different deposition times from 10 min to 40 min, which resulted in films of different thicknesses. Characterization techniques, such as x-ray diffraction (XRD) and field emission-scanning electron microscopy (FE-SEM) were used to characterize the structural and morphological properties of the TiO 2 thin films. XRD patterns showed the formation of (101) crystal anatase facets. The grain size values of the film increased with increased deposition time, and the films deposited at 40 min exhibited a porous structure. Anatase TiO 2 thin films exhibited excellent sensing response, fast response and recovery time, as well as good stability and selectivity towards ammonia (NH 3 ). The enhanced NH 3 sensing behavior of anatase TiO 2 films is attributed to the porous morphology and oxygen vacancies.

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Nanostructured TiO2 films: Enhanced NH3 detection at room temperature

Cited by 74 publications

References 35 publications

RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate

RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate

UV-assisted room-temperature chemiresistive NO2 sensor based on TiO2 thin film

Porous Anatase TiO2 Thin Films for NH3 Vapour Sensing

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