2013
DOI: 10.1016/j.apsusc.2013.07.060
|View full text |Cite
|
Sign up to set email alerts
|

Nanostructured ZnO films with various morphologies prepared by ultrasonic spray pyrolysis and its growing process

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

1
8
0

Year Published

2014
2014
2020
2020

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 29 publications
(9 citation statements)
references
References 10 publications
1
8
0
Order By: Relevance
“…The position of the peaks shifts towards lower angles when increasing the substrate temperature from 473 K to 523 K and then towards larger angles when increasing the substrate temperature up to 623 K. The peaks shift again towards lower angles when increasing the deposition temperature from 623 K to 673 K. This complex pattern can be explained by a combination of the compositional evolution of the material and presence of residual stresses in the films as previously observed in . These residual stresses could be caused by both the lattice mismatch and thermal expansion coefficient difference between film and substrate .…”
Section: Resultssupporting
confidence: 61%
“…The position of the peaks shifts towards lower angles when increasing the substrate temperature from 473 K to 523 K and then towards larger angles when increasing the substrate temperature up to 623 K. The peaks shift again towards lower angles when increasing the deposition temperature from 623 K to 673 K. This complex pattern can be explained by a combination of the compositional evolution of the material and presence of residual stresses in the films as previously observed in . These residual stresses could be caused by both the lattice mismatch and thermal expansion coefficient difference between film and substrate .…”
Section: Resultssupporting
confidence: 61%
“…ZnO thin films, which are used for this purpose, should be in a single phase and have high transmittance and electrical conductivity, low microstresses and microstrains grades, and a small dislocation density. Increased transmission in ZnO layers could be achieved by deposition of nanocrystalline films which would have a larger band gap due to the quantum confinement effect .…”
Section: Introductionmentioning
confidence: 99%
“…The resistivity values of ZnO films may be adjusted between 10 -3 Ω cm and 10 -5 Ω cm by changing the annealing conditions and doping [10]. Currently, many methods are being used to prepare ZnO films, such as molecular beam epitaxy (MBE), chemical vapor deposition, electrochemical deposition, pulsed laser deposition (PLD), sol-gel process, reactive evaporation, magnetron sputtering technique and spray pyrolysis [11][12][13][14][15][16].…”
Section: Introductionmentioning
confidence: 99%