Advanced Nano Deposition Methods 2016
DOI: 10.1002/9783527696406.ch3
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Nanostructures and Thin Films Deposited with Sputtering

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“…We chose this deposition process because it provides a high material utilization efficiency, and a deposition rate as low as 1 Å/s, which permits a very precise control on both thermodynamics and geometry of the films. Other techniques described in the literature are chemical vapor deposition (CVD) [ 30 ], sputtering [ 31 ], spray pyrolysis [ 32 ] and atomic layer deposition (ALD) [ 33 ]. We have analyzed the structural and electrochemical dependence of the deposited films with temperature, time and Sn composition.…”
Section: Introductionmentioning
confidence: 99%
“…We chose this deposition process because it provides a high material utilization efficiency, and a deposition rate as low as 1 Å/s, which permits a very precise control on both thermodynamics and geometry of the films. Other techniques described in the literature are chemical vapor deposition (CVD) [ 30 ], sputtering [ 31 ], spray pyrolysis [ 32 ] and atomic layer deposition (ALD) [ 33 ]. We have analyzed the structural and electrochemical dependence of the deposited films with temperature, time and Sn composition.…”
Section: Introductionmentioning
confidence: 99%