“…To remove organic contaminants, the surface of the SOI-NW sensor chips was treated, as described elsewhere [ 32 , 41 , 42 ], with aqueous isopropanol solution, and then with a solution containing HF and ethanol (in order to remove the native oxide layer formed during the chip storage). After such a treatment, the chip was incubated in an ozonator (UV Ozone Cleaner–ProCleaner ™ Plus, BioForce Nanosciences, (Ossila Ltd., Sheffield, UK) in order to form hydroxyl groups on the SOI-NW surface, then it was silanized with APTES (as described in our previous papers [ 41 , 43 , 44 ]), washed with ethanol and dried [ 41 ].…”