“…The fabrication of ideal semiconductor nanowires has become a global focus in recent years due to their promising physical properties for a wide range of potential applications in the fields of nanoelectronics and nano-optoelectronics, including biological or chemical sensors, 1 logic gates and computation units, 2 light emitting diodes, 3 high-performance field effect transistors, 3 nanowire lasers, 4,5 resonant tunneling diodes, 6 single electron tunneling diodes for high-density information storage, 7 and high-speed thermoelectric devices. 8 Currently, the vapor-liquid-solid growth mechanism, proposed by Wagner and Ellis several decades ago, 9 has been the dominant growth mechanism for growing semiconductor nanowires and these semiconductor nanostructures are commonly grown by chemical vapor deposition, 10 metal-organic chemical vapor deposition ͑MOCVD͒, 11 molecular beam epitaxy, 12 and chemical beam epitaxy.…”