2009
DOI: 10.1016/j.jallcom.2008.12.125
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Natural superhydrophilic TiO2/SiO2 composite thin films deposited by radio frequency magnetron sputtering

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Cited by 54 publications
(29 citation statements)
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“…The contact angle, which was 49.8 before coating, falls to 10.4 , 5.2 and 2.5 for the as-deposited sample and the annealed samples at 250 and 500 C, respectively. Interestingly, the contact angle slightly increased back to 7.8 with a higher annealing treatment at 750 C. Therefore, the contact angle inversely depends on the roughness, which provides an additional interfacial area for spreading water and lowers its surface tension [32]. It is believed that the roughness is the main factor controlling the contact angle.…”
Section: Resultsmentioning
confidence: 99%
“…The contact angle, which was 49.8 before coating, falls to 10.4 , 5.2 and 2.5 for the as-deposited sample and the annealed samples at 250 and 500 C, respectively. Interestingly, the contact angle slightly increased back to 7.8 with a higher annealing treatment at 750 C. Therefore, the contact angle inversely depends on the roughness, which provides an additional interfacial area for spreading water and lowers its surface tension [32]. It is believed that the roughness is the main factor controlling the contact angle.…”
Section: Resultsmentioning
confidence: 99%
“…Binary TiO 2 -SiO 2 coatings cover a wide range of achievable refractive index [6,7] from approximately 1.45 to 2.55 because of the large difference in refractive index of the two compounds. A large number of deposition techniques including electron beam evaporation [8], sputtering [9], pulsed laser deposition [10], sol-gel [11,12,13] and chemical vapor deposition [14] have been used to prepare the binary TiO 2 -SiO 2 coatings. However, most reports deal with these types of thin films on an empirical basis, without correlating the actual values of the optical parameters with the type of thin film microstructure and the composition.…”
Section: Introductionmentioning
confidence: 99%
“…Since then, hydrophilic titanium dioxide materials have attracted attention for many practical applications such as self-cleaning and antifogging materials. TiO 2 thin films can be prepared by numerous techniques such as chemical vapor deposition [2], thermal oxidation of electron beam evaporation [3], ion assisted deposition [4], sol-gel processes [5,6], and sputtering [7,8]. Among these techniques, RF magnetron sputtering method provides more advantages in controlling the microstructure and composition of the films.…”
Section: Introductionmentioning
confidence: 99%