2018
DOI: 10.1016/j.microrel.2018.07.138
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NBTI and irradiation related degradation mechanisms in power VDMOS transistors

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Cited by 13 publications
(3 citation statements)
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“…It is illustrated that the interface trap density N it raises obviously along with radiation dose at an approximate rate of 6.58 × 10 9 cm −2 per 100 krad(Si). The value of interface trap density in our study is slightly smaller than that of Bonaldo's work [27], and higher than the value of N. Stojadinović's research [34]. This may be caused by the different tested method and manufacturing process.…”
Section: Resultscontrasting
confidence: 81%
“…It is illustrated that the interface trap density N it raises obviously along with radiation dose at an approximate rate of 6.58 × 10 9 cm −2 per 100 krad(Si). The value of interface trap density in our study is slightly smaller than that of Bonaldo's work [27], and higher than the value of N. Stojadinović's research [34]. This may be caused by the different tested method and manufacturing process.…”
Section: Resultscontrasting
confidence: 81%
“…Among the others, in Refs. [17][18][19], the effects induced by previous irradiation and the total dose received strongly affect the subsequent stresses. Specifically, in the case of low-dose irradiation, following stress caused by working in specific applications, this appears to result in device degradation in the future.…”
Section: Introductionmentioning
confidence: 99%
“…This leads to an increase in the overall circuit cost, complexity, and problems in the electronics, such as negative bias temperature instability, hot carrier injection, etc. [11][12][13][14][15][16][17].…”
Section: Introductionmentioning
confidence: 99%