Near‐Field Energy Transfer between a Luminescent 2D Material and Color Centers in Diamond

Nelz, Richard; Radtke, Mariusz; Slablab, Abdallah; Xu, Zai‐Quan; Kianinia, Mehran; Li, Chi; Bradac, Carlo; Aharonovich, Igor; Neu, Elke

doi:10.1002/qute.201900088

Cited by 21 publications

(14 citation statements)

References 34 publications

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“…To investigate the photonic properties of our SCD nanostructures, we used a custom-built confocal microscope (numerical aperture 0.8). Details of the setup are given in References [22,29,30,31].…”

Section: Final Devices and Device Characterizationmentioning

confidence: 99%

Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing

et al. 2019

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In this manuscript, we outline a reliable procedure to manufacture photonic nanostructures from single-crystal diamond (SCD). Photonic nanostructures, in our case SCD nanopillars on thin (<1 μm) platforms, are highly relevant for nanoscale sensing. The presented top-down procedure includes electron beam lithography (EBL) as well as reactive ion etching (RIE). Our method introduces a novel type of inter-layer, namely silicon, that significantly enhances the adhesion of hydrogen silsesquioxane (HSQ) electron beam resist to SCD and avoids sample charging during EBL. In contrast to previously used adhesion layers, our silicon layer can be removed using a highly-selective RIE step, which is not damaging HSQ mask structures. We thus refine published nanofabrication processes to ease a higher process reliability especially in the light of the advancing commercialization of SCD sensor devices.

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Section: Final Devices and Device Characterizationmentioning

confidence: 99%

Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing

et al. 2019

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“…Additionally, NV centers find applications as quantum memories [16], quantum registers [17], and in several other areas of emerging quantum technologies [6]. Rapid improvement in nano-fabrication methods [18][19][20], material science research [21,22], as well as control methodologies [4,6,[23][24][25] have led to a variety of NV-based quantum sensors with applications in the fields of life sciences [26,27], and material studies [28].…”

Section: Introductionmentioning

confidence: 99%

Robust Magnetometry with Single NV Centers via Two-step Optimization

Oshnik,

Rembold,

Calarco

et al. 2021

Preprint

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The negatively charged nitrogen-vacancy (NV) center in diamond is a widely-used platform in the rapidly growing field of quantum technologies. In particular, NV centers near the surface of the diamond can offer nanoscale resolution as they can be brought into proximity of the sample. However, these shallow single NV centers experience considerable noise from the surface in addition to the perturbation from the spin bath in the bulk diamond crystal. This lowers the spin coherence and lifetimes leading to limited sensing capabilities. This work presents a two-step approach to improve both the spin initialization/readout and the spin manipulation processes by applying optimization algorithms to the laser and microwave controls. The goal is to increase the NV's readout contrast aiming for control pulses that are robust against power variation. With the assistance of feedbackbased (closed-loop) optimization, limitations imposed by experimental imperfections and unknown system parameters are inherently considered. For pulsed ODMR-measurements, the optimization leads to sensitivities staying below 1 µT Hz − 1 2 for an 83% decrease in the control power, increasing the robustness by approximately one third compared to the original sequence. Furthermore, we report sensitivities below 100 nT Hz − 1 2 for Ramsey measurements, where optimized control pulses result in a two-fold improvement in the sensitivity. Both schemes were optimized for DC magnetic field sensing over a large range of control amplitudes. Such optimized sensing schemes are suitable for a variety of magnetometry setups that require robustness, e.g. (inhomogeneous) ensembles of NV centers, or NV scanning probes operating at different distances from the MW antenna.

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“…Diamond photonics is a new and prospective area of research due to unique set of diamond properties: broadband transparency in range from UV (225 nm) to far IR (20 μm), the large Kerr constant 1.3 Â 10 À19 m 2 W À1 , relatively high refractive index 2.4, and record high thermal conductivity. [1,2] Moreover, diamond color centers, specifically, nitrogen-vacancy, silicon-vacancy, and germaniumvacancy, are one of the most promising quantum systems for information processing, [3] physical sensing, [4,5] and single-photon applications. [6] Widespread complementary metal oxide semiconductor technologies cannot be applied to diamond [7] due to its high chemical resistance; thus, the development of diamond photonics devices (DPD) became possible only recently due to great technological progress in diamond micro-and nanoscale structuring.…”

Section: Introductionmentioning

confidence: 99%

“…Chlorine is a dangerous gas requiring expensive special equipment for its disposal. The other common methods used for waveguide fabrication in the previous studies [5,8,14] include fabrication of SiO 2 protective masks from hydrogen silsesquioxane (HSQ) with e-beam lithography.…”

Section: Introductionmentioning

confidence: 99%

Two‐Step Reactive Ion Etching Process for Diamond‐Based Nanophotonics Structure Formation

Голованов

Luparev

Troschiev

et al. 2020

Physica Status Solidi (a)

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Diamond surface modification is one of the most important technological challenges in the creation of diamond quantum photonics devices. It is necessary to fabricate different 3D structures on the crystal surface with both vertical and V‐shaped etching grooves for waveguides, grating couplers, and mesastructures. Herein, the applicability of SF6‐based plasma for diamond processing is studied. SF6 plasma etches diamond five times faster than commonly used Ar/O2 3:1 at the same pressure and bias, but it cannot provide vertical diamond structures due to the ion scattering. Herein, the two‐step plasma processing method is developed with Molybdenum protective masks that provide steep diamond 3D structures with sidewall roughness less than 40 nm and is, therefore, suitable for nanophotonics and other diamond applications. Mo can be chemically patterned by low‐power SF6 plasma and then used as a hardmask for anisotropic etching of diamond in Ar/O2 plasma with a selectivity of 27. Unlike common methods of diamond processing, the proposed two‐step method does not require chlorine.

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Near‐Field Energy Transfer between a Luminescent 2D Material and Color Centers in Diamond

Cited by 21 publications

References 34 publications

Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing

Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing

Robust Magnetometry with Single NV Centers via Two-step Optimization

Two‐Step Reactive Ion Etching Process for Diamond‐Based Nanophotonics Structure Formation

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