Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer

Abstract

SummaryA general concept for parallel near-field photochemical and radiation-induced chemical processes for the fabrication of nanopatterns of a self-assembled monolayer (SAM) of (3-aminopropyl)triethoxysilane (APTES) is explored with three different processes: 1) a near-field photochemical process by photochemical bleaching of a monomolecular layer of dye molecules chemically bound to an APTES SAM, 2) a chemical process induced by oxygen plasma etching as well as 3) a combined near-field UV-photochemical and ozone-induced chemical process, which is applied directly to an APTES SAM. All approaches employ a sandwich configuration of the surface-supported SAM, and a lithographic mask in form of gold nanostructures fabricated through colloidal sphere lithography (CL), which is either exposed to visible light, oxygen plasma or an UV–ozone atmosphere. The gold mask has the function to inhibit the photochemical reactions by highly localized near-field interactions between metal mask and SAM and to inhibit the radiation-induced chemical reactions by casting a highly localized shadow. The removal of the gold mask reveals the SAM nanopattern.

Highly Transparent, Flexible Conductors and Heaters Based on Metal Nanomesh Structures Manufactured Using an All-Water-Based Solution Process

“…Selfassembled monolayers of APTES were deposited on the substrate, and high-resolution patterns were produced using UV-ozone exposure through a quartz-chrome photomask. 39 Then, the microcontact dip-coating (MCDC) method was used to minimize material consumption during the Au NP deposition and silver enhancement steps. A glass slide (cover plate) cleaned using air plasma was fixed on the APTES-patterned substrate with a spacer to fix the gap between them.…”

“…In order to induce deposition of colloidal Au NPs and enhance the adhesion strength of the silver mesh, APTES was used as it has high affinity with silver and gold due to its amine group. Self-assembled monolayers of APTES were deposited on the substrate, and high-resolution patterns were produced using UV-ozone exposure through a quartz-chrome photomask . Then, the microcontact dip-coating (MCDC) method was used to minimize material consumption during the Au NP deposition and silver enhancement steps.…”