1999
DOI: 10.1063/1.123168
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Near-field photolithography with a solid immersion lens

Abstract: We have exposed 190 nm lines in photoresist by focusing a laser beam (λ=442 nm) in a solid immersion lens (SIL) that is mounted on a flexible cantilever and scanned by a modified commercial atomic force microscope. The scan rate was 1 cm/s, which is several orders of magnitude faster than typical reports of near-field lithography using tapered optical fibers. The enhanced speed is a result of the high optical efficiency (about 10−1) of the SIL. Once exposed with the SIL, the photoresist was developed and the p… Show more

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Cited by 146 publications
(65 citation statements)
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“…A SIL probe with a spot size of approximately 100 nm transmits about 50% of the optical power [25,28,38]. By comparison, a metal-coated fiberprobe with a 100 nm aperture transmits only a fraction (10 -3 -10 -6 ) of the light coupled into the fiber [16,[39][40][41].…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…A SIL probe with a spot size of approximately 100 nm transmits about 50% of the optical power [25,28,38]. By comparison, a metal-coated fiberprobe with a 100 nm aperture transmits only a fraction (10 -3 -10 -6 ) of the light coupled into the fiber [16,[39][40][41].…”
Section: Discussionmentioning
confidence: 99%
“…Further applications include high-resolution imaging [24][25][26][27], lithography [28,29] and spectroscopy [24,30].…”
Section: The Near-field Accessed With Solid Immersion Lens Technologymentioning
confidence: 99%
“…Since its invention, the SIL has been exploited in several nanoscale technologies, including semiconductor integrated-circuit (IC) inspection [1][2][3], nanoscale spectroscopy [4,5], optical data storage [6,7] and photolithography [8], yet the benefits the SIL has introduced in these fields have received poor coverage. Therefore, in this paper we aim to review the theoretical aspects of the SIL and to discuss recent demonstrations of SIL-enhanced technologies in nanophotonics.…”
Section: Introductionmentioning
confidence: 99%
“…The enhancement of the peak intensity provides an additional confirmation of the immersion effect in the nano-SIL. Prospective applications of such nano-SILs include near-field focusing and imaging [11], optical data storage [19], and maskless direct-write lithography [20]. Furthermore, the introduction of plasmonic structures on the bottom of the SIL could further improve performance and resolution [21].…”
mentioning
confidence: 99%