Near-field x-ray lithography to 15 nm

Abstract

It is time to revisit X-ray. By enhancing, in the Near Field, Proximity X-ray Lithography (PXL), the technique is demonstrated that extends to 15 nm printed feature size with 2: 1 ratio of pitch to line width. "Demagnification by bias" of clear mask features is positively used in Fresnel diffraction together with rapid, multiple exposures of sharp peaks. Pitch is kept small by multiple, stepped exposures of the intense image followed by single development. The optical field is kept compact at the mask. Since the mask-wafer gap scales as the square of the mask feature size, mask feature sizes and mask-wafer gaps are comparatively large. A Critical Condition has been identified which is typically used for the highest resolution. Many devices, including batches of microprocessors, have been demonstrated previously by traditional 1X PXL which is the most mature of the Next Generation Lithographies and which is now further extended. Throughput and cost are conventional.

Magnonic Band Engineering by Intrinsic and Extrinsic Mirror Symmetry Breaking in Antidot Spin-Wave Waveguides

“…However, with the recent advances in fabrication techniques, it has become feasible to pattern with resolution below 10 nm. For example, the spot size during focused ion beam lithography can go below 10 nm with low (≈30 pA) ion current1430313233. To predict properties of magnonic devices at nanometer length scale, more basic research needs to be conducted.…”

The Stable Wave Packet and Uncertainty

“…This shows scattering due to the emergence of a plane wave from a narrow horizontal slit. A cut of the calculated intensity on the plane at the Critical Condition [24] [25] is shown in the inset. At this condition 4 the slit is optimally focused by Fresnel diffraction for high resolution proximity printing.…”

Near field x-ray lithography simulations for printing fine bridges

“…Proximity x-ray lithography (PXL) is, on the International Technology Roadmap for Semiconductors, a contender for application in next generation lithography. PXL is extensible to 15 nm print resolution using near field rays and demagnification by bias, without lenses or mirrors [1,2]. Prints with feature size down to 25 nm have been demonstrated [1][2][3][4][5].…”

“…PXL is extensible to 15 nm print resolution using near field rays and demagnification by bias, without lenses or mirrors [1,2]. Prints with feature size down to 25 nm have been demonstrated [1][2][3][4][5]. Typical 1-2 kV broadband incident beam energies (1.2-0.6 nm wavelengths) were used, and demagnifications down to 6× were obtained.…”

“…Meanwhile, the optical field is kept compact as in traditional 1× PXL. Dense nested features are obtained and demonstrated [1] by rapid multiple exposures of sharp peaks and single development. Demagnification has considerable importance in a wide range of applications including integrated circuit manufacture and manufacture of micro electromechanical systems.…”