2012
DOI: 10.1364/ol.37.000566
|View full text |Cite
|
Sign up to set email alerts
|

Near-surface modification of optical properties of fused silica by low-temperature hydrogenous atmospheric pressure plasma

Abstract: In this Letter, we report on the near-surface modification of fused silica by applying a hydrogenous atmospheric pressure plasma jet at ambient temperature. A significant decrease in UV-transmission due to this plasma treatment was observed. By the use of secondary ion mass spectroscopy, the composition of the plasma-modified glass surface was investigated. It was found that the plasma treatment led to a reduction of a 100 nm thick SiO2 layer to SiOx of gradual depth-dependent composition. For this plasma-indu… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

3
16
0

Year Published

2012
2012
2023
2023

Publication Types

Select...
7
1

Relationship

5
3

Authors

Journals

citations
Cited by 23 publications
(19 citation statements)
references
References 18 publications
3
16
0
Order By: Relevance
“…However, in the case of a pure morphologic surface smoothing, the transmission should rather increase due to a reduction of scattering losses. The above-presented decrease in transmission thus indicates a change in index of refraction as also verified in previous work [16].…”
Section: Plasma Pre-treatmentsupporting
confidence: 88%
See 1 more Smart Citation
“…However, in the case of a pure morphologic surface smoothing, the transmission should rather increase due to a reduction of scattering losses. The above-presented decrease in transmission thus indicates a change in index of refraction as also verified in previous work [16].…”
Section: Plasma Pre-treatmentsupporting
confidence: 88%
“…As a result, high-reactive hydrogen species are available within the plasma volume and on the fused silica surface, respectively. Two plasma-induced effects were observed by secondary ion mass spectroscopy (SIMS): First, a near-surface chemical reduction of silicon dioxide SiO 2 to silicon suboxide (SiO x , where 1 < x < 2) with an overall thickness of the reduced glass matrix of approximately 100 nm; and second, an implantation of hydrogen into deeper regions of the glass network [16,17].…”
Section: Basic Considerationsmentioning
confidence: 99%
“…49 Furthermore, the electrical breakdown strength is one order of magnitude larger for quartz than for alumina (c.f. Yoshimura and Bowen, 50 Lynch 51 ).…”
Section: Methodsmentioning
confidence: 99%
“…For example, several etching techniques such as laser-induced backside wet etching (LIBWE) [10,11] or the use of UV-absorbing films [12,13] can be applied. By an atmospheric pressure plasma treatment of fused silica using a hydrogenous process gas, optical parameters of the bulk material such as its UV-absorbance can be modified [14]. This effect can be used for improving nanosecond laser micro-structuring properties and reducing the energy required for ablation [15].…”
Section: Introductionmentioning
confidence: 99%