2003
DOI: 10.1557/jmr.2003.0008
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Near-threshold ultraviolet-laser ablation of Kapton film investigated by x-ray photoelectron spectroscopy

Abstract: Near-threshold ultraviolet-laser (355 nm) ablation of 125-μm thick Kapton films was investigated in detail using x-ray photoelectron spectroscopy. Different from the irradiation at higher fluences, the contents of the oxygen, amide group, and C–O group on the ablated surface increased with an increase in the pulse number, whereas the carbon contents decreased, although the contents of the nitrogen and the carbonyl group (C = O) decreased slightly. This implied that there was no carbon-rich residue on the ablat… Show more

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Cited by 5 publications
(4 citation statements)
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“…Finally, the peak at 288.6 eV (peak 5) corresponds to the carbonyl carbon from the imide ring. 29,31…”
Section: Resultsmentioning
confidence: 99%
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“…Finally, the peak at 288.6 eV (peak 5) corresponds to the carbonyl carbon from the imide ring. 29,31…”
Section: Resultsmentioning
confidence: 99%
“…Finally, the peak at 288.6 eV (peak 5) corresponds to the carbonyl carbon from the imide ring. 29,31 As shown in Figure 11(b), XPS spectra from the oxidized surface showed distinct differences from the interior. In particular, the shift of the carbonyl peak from 288.6 eV to 288.2 eV reflects consumption of imide rings and generation of oxidation products on the polymer surface.…”
Section: Surface Xps Analysismentioning
confidence: 94%
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“…In the literature, decomposition schemes of PI by ultraviolet laser ablation have been proposed. 36,37) The plausible scheme consists of three steps: first, breakage of the -N-(CO)bond in the imide ring; second, breakage of the C-O-C in the aryl ether group; and third, decomposition of the aromatic group (see the chemical structure of PI illustrated in Fig. 2).…”
Section: Discussionmentioning
confidence: 99%