Nebulous hotspot and algorithm variability in computation lithography

Abstract

Computation lithography relies on algorithms. However, these algorithms exhibit variability that can be as much as 5% ͑one standard deviation͒ of the critical dimension for the 65-nm technology. Using hotspot analysis and fixing as an example, we argue that such variability can be addressed on the algorithm level via controlling and eliminating its root causes, and on the application level by setting specifications that are commensurate with both the limitations of the algorithms and the goals of the application.

Topology-oriented pattern extraction and classification for synthesizing lithography test patterns

“…Lithography hotspots, which are the patterns that are likely to cause pattern failures or defects, 6 usually arise in complicated patterns which exhibit an abrupt change of geometrical topology (e.g., pitch is broken) as shown in Fig. 2.…”