We
report on the fabrication, characterization, and microthermometry
application of high-quality, nanometric thin films, with thicknesses
in the range 20–200 nm, of the molecular spin-crossover complex
[Fe(HB(1,2,3-triazol-1-yl)3)2]. The films were
obtained by vacuum thermal evaporation and characterized by X-ray
diffraction, UV spectrophotometry, and atomic force microscopy. The
as-deposited films are dense and crystalline with a preferred [011]
orientation of the monoclinic crystal lattice normal to the substrate
surface. The films exhibit a gradual spin conversion centered at ca.
374 K spanning the 273–473 K temperature range, irrespective
of their thickness. When deposited on a microelectronic device, these
films can be used to enhance the UV-light thermoreflectance coefficient
of reflective surfaces by more than an order of magnitude, allowing
for high-sensitivity thermoreflectance thermal imaging.