2019
DOI: 10.1088/1674-1056/ab3e00
|View full text |Cite
|
Sign up to set email alerts
|

Negative transconductance effect in p-GaN gate AlGaN/GaN HEMTs by traps in unintentionally doped GaN buffer layer*

Abstract: We investigate the negative transconductance effect in p-GaN gate AlGaN/GaN high-electron-mobility transistor (HEMT) associated with traps in the unintentionally doped GaN buffer layer. We find that a negative transconductance effect occurs with increasing the trap concentration and capture cross section when calculating transfer characteristics. The electron tunneling through AlGaN barrier and the reduced electric field discrepancy between drain side and gate side induced by traps are reasonably explained by … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2

Citation Types

1
4
0

Year Published

2020
2020
2024
2024

Publication Types

Select...
4
2
1

Relationship

0
7

Authors

Journals

citations
Cited by 8 publications
(5 citation statements)
references
References 27 publications
1
4
0
Order By: Relevance
“…The SELB model is used for simulating the breakdown voltage of the device and the model parameters are the same as the reported by Kunihiro[9]. In this work, physical models are calibrated through the comparative analysis of the transfer characteristic curve of a conventional p-GaN HEMT with previous experimental result [8]. Figure 2 shows that the transfer characteristic from this work is similar to the reported result.…”
Section: Device Structure and Simulation Modelsupporting
confidence: 62%
See 1 more Smart Citation
“…The SELB model is used for simulating the breakdown voltage of the device and the model parameters are the same as the reported by Kunihiro[9]. In this work, physical models are calibrated through the comparative analysis of the transfer characteristic curve of a conventional p-GaN HEMT with previous experimental result [8]. Figure 2 shows that the transfer characteristic from this work is similar to the reported result.…”
Section: Device Structure and Simulation Modelsupporting
confidence: 62%
“…To accurately simulate the recombination and scattering processes of charge carriers, donor and acceptor traps are introduced into the GaN channel. The donor trap energy level is set 3.2 eV above the valence band maximum and the acceptor trap energy level is set 0.4 eV below the conduction band minimum [8]. The HEMT device uses Schottky contact to improve the positive shift of the threshold voltage.…”
Section: Device Structure and Simulation Modelmentioning
confidence: 99%
“…The Central Sterile Supply Department (CSSD), a key department for nosocomial infection prevention and control, supplies a variety of sterile instruments, utensils, and articles for the hospital. The quality of CSSD work can directly affect medical treatment quality and patient safety [ 1 , 2 ]. The “Central Sterile Supply Department (CSSD) – Part II: Standard for operating procedure of cleaning, disinfection and sterilization” implemented in China in June 2017 [ 3 ] states that the sealing width of paper-plastic pouches should be ≥6 mm.…”
Section: Introductionmentioning
confidence: 99%
“…[6,7] For safe-failed operation and simple drive circuits, designs of normally-off GaN devices are essential, [8,9] and several techniques to realize normally-off GaN devices have been proposed like thin AlGaN barrier, [10] fluorine implantation, [11] trench gate. [12] Recently p-GaN gate technique has become the most prevalent method to achieve normally-off GaN HEMTs, [13][14][15] and based on this technique several high breakdown voltage GaN HEMTs with high breakdown voltage and high switching speed have been released. [16,17] As far as we know for p-GaN gate GaN HEMTs the highest average breakdown electric field and figure of merit (FOM) are 1.4 MV/cm and 3.9 GW/cm 2 .…”
Section: Introductionmentioning
confidence: 99%