New chemical removing and air cooling technology for clean room recirculation air using chilled pure water showering method

Wakamatsu, H.; Matsuki, Masato; Tanaka, N.; Iwanaga, Yoichi; Murata, Keiichi

doi:10.1109/issm.2001.963021

Cited by 1 publication

(1 citation statement)

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“…Wakamatsu et al (2000) developed a cooled-type, two-stage air washer in make-up air units to remove high-concentration AMCs from intake-air. Furthermore, Wakamatsu et al (2001) used 7 C pure water showering to remove water-soluble substances, such as NH þ 4 and amine ions, for cleanroom recirculation air. Ishihara et al (2000) proposed a molecular contamination-free clean dry air (CDA) system for atmosphere control in a closed manufacturing system and confirmed that concentration of each contaminant was less than 10 ppb.…”

Section: Limitation Of Chemical Filtersmentioning

confidence: 99%

Ultra-pure air (UPA) for AMC control in nano-processing environment

Chuang

Chang

2013

Journal of the Chinese Institute of Engineers

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As semiconductor processes advance into the nano-technology era, airborne molecular contamination (AMC) has become a major problem that severely affects production processes and yields. The damage caused by AMC in nano-scale technology production has been found to be much worse than contamination related to conventional airborne particulates. To address these AMC problems, an ultra-pure air (UPA) approach has been explored and its prototype pre-treatment system has been experimented with. The schematic of a UPA system is composed of three processing steps. In the first step, UV 185þ254 nm is used to provide sufficient energy to break the molecular bonds of the contaminants. In this stage, aerosol droplets are introduced to react with these unstable compounds and form hydrophilic substances. After the 'immersing photochemical' oxidation process, the second step involves contaminants flowing through a compression and condensation module. In this concentrating module, nucleation, condensation, and growth of the aerosols are facilitated to increase the collision probability between the contaminants and water droplets. Further on, a dehumidifying device removes the water droplets within the air, so the contaminants dissolved in the water are removed together with the water during the dehumidification process. The third step is to remove the remaining contaminants, which cannot be completely treated away in the previous steps, through specifically selective molecular sieves and other corresponding filtration devices. Xylene was used to exemplify a prototype system framed with a target level of 10 ppt capability. The purpose of this article is twofold. One is to introduce the UPA system and its theoretical rationales. The other is to experimentally demonstrate the effectiveness of using immersed UV for mitigating AMC problems.

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Section: Limitation Of Chemical Filtersmentioning

confidence: 99%