Surfaces and Interfaces
 2024
DOI: 10.1016/j.surfin.2024.104014
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New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition

Mohd Zahid Ansari,
Petr Janicek,
Sook NamGung
et al.
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