2013
DOI: 10.1021/ma3024359
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New Cleavable Photoinitiator Architecture with Huge Molar Extinction Coefficients for Polymerization in the 340–450 nm Range.

Abstract: A new Type I photoinitiator Tr_DMPA is described. It consists in three 2,2′-dimethoxy 2-phenyl acetophenone (DMPA) units grafted onto a truxene (Tr) scaffold. Compared to DMPA itself, the lowest electronic transition exhibits a ππ* character and the corresponding molar extinction coefficients ε are increased from about 400 M–1 cm–1 (at about 332 nm for DMPA) to 63 000 M–1 cm–1 (at 338 nm for Tr_DMPA); such huge values are exceptional in Type I photoinitiators at this wavelength. Tr_DMPA undergoes a fast cleava… Show more

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Cited by 78 publications
(51 citation statements)
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“…[8][9][10][11][12][13] However, most reported and commercial PIs exhibit less-than-perfect performance upon LED irradiation because they have a maximum absorbance below 365 nm where the most common and cost-effective UV/LED lamps irradiate. 14 In the reported PIs, substituted ketones (e.g., the well-known 2,2-dimethoxy-2-phenylacetophenone (DMPA), 15,16 benzophenone (BP), [17][18][19][20][21] or thioxanthone (TX) [22][23][24][25][26] ) can work as cleavable (Type I) or uncleavable (Type II) PIs, and their photogenerated radicals is used for universal application in free-radical polymerization (FRP), free-radical-promoted cationic photopolymerization, or in cationic polymerization (CP) (as photosensitizers). The excellent properties of ketone derivatives provide them with interesting potential applications for polymer synthesis.…”
mentioning
confidence: 99%
“…[8][9][10][11][12][13] However, most reported and commercial PIs exhibit less-than-perfect performance upon LED irradiation because they have a maximum absorbance below 365 nm where the most common and cost-effective UV/LED lamps irradiate. 14 In the reported PIs, substituted ketones (e.g., the well-known 2,2-dimethoxy-2-phenylacetophenone (DMPA), 15,16 benzophenone (BP), [17][18][19][20][21] or thioxanthone (TX) [22][23][24][25][26] ) can work as cleavable (Type I) or uncleavable (Type II) PIs, and their photogenerated radicals is used for universal application in free-radical polymerization (FRP), free-radical-promoted cationic photopolymerization, or in cationic polymerization (CP) (as photosensitizers). The excellent properties of ketone derivatives provide them with interesting potential applications for polymer synthesis.…”
mentioning
confidence: 99%
“…The current efforts result in an amazing series of proposals of new PISs . For example, we have recently introduced PISs ( [99][100][101][102][103][104][105][106][107]) exhibiting really novel absorption properties (red-shift absorptions, multicolor absorptions, enhanced molar extinction coefficients, ε): e.g., colored substituted or functionalized ketones [60], modified organometallic derivatives [70][71][72][108][109][110][111][112][113][114][115][116][117] (ruthenium-, iridium-, platinum-, zirconium-and zinc-based complexes, titanocene derivatives…), various series of dye-based skeletons [61][62][63][65][66][67][68][74][75][76] (e.g., phenylenediamine, polystilbene, polyazine, violanthrone, acridinedione, 2,7-di-tert-butyldimethyldihydropyrene, bodipy, boranyl, thiophene, perylene bis-dicarboximide, hydrocarbons, pyrromethene, pyridinium salt…), di-and tri-functional architectures of photo initiators [64], light harvesting compounds [57,58] (where a strong molecular orbital coupling occurs, leading to ε huge values) and push-pull and multicolor photoinitiators (novel chromophores; donor--acceptor arrangements; unusual broad absorptions from the blue to the red wavelengths…).…”
Section: The Development Of New Photosensitive Systemsmentioning
confidence: 99%
“…Therefore, visible photons can be successfully used and Hg lamps avoided. The recent development of di-and tri-functional architectures of PIs, light harvesting PIs and push-pull and multicolor PIs opens a route towards highly absorbing PIs in the 400-800 nm range [57,58,64,73].…”
Section: A/ Soft or Eco-friendly Photopolymerization Of Synthetic Momentioning
confidence: 99%
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