New Concepts for X-Ray, Soft X-Ray, and EUV Optical Instrumentation Including Applications in Spectroscopy, Plasma Diagnostics, and Biomedical Microscopy: A Status Report

Kantsyrev, V. L.; Bruch, R.; Phaneuf, R. A.; Publicover, Nelson G.

doi:10.3233/xst-1997-7206

Cited by 3 publications

(4 citation statements)

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“…The results are of interest for developing the technology of capillary systems manufacture (see, for an example, Ref. 27) and for developing unitary wave theory for spreading electromagnetic radiation in the limits of grazing reflections from surfaces.…”

Section: Discussionmentioning

confidence: 99%

Wave optics treatment of x-rays passing through tapered capillary guides

et al. 2000

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The propagation of soft x‐rays generated by a small‐diameter incoherent source through a tapered, plane capillary‐type waveguide was studied using the Fresnel–Kirchhoff theory and method of images. The diffraction and interference are manifested by the appearance of the diffraction fringes in both the near‐ and far‐field zones of the waveguide output. The experimental data confirm such behaviour of the x‐radiation. Copyright © 2000 John Wiley & Sons, Ltd.

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Section: Discussionmentioning

confidence: 99%

Wave optics treatment of x-rays passing through tapered capillary guides

et al. 2000

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“…Such fundamental x-ray studies are of importance to elucidate the spectral composition and characteristics of short wavelength radiation emitted from highly charged ions. As a subsequent development, we envision to create new optical methods of microspectroscopy and mi-croimaging in the EUV, soft x-ray and x-ray regions using single highly charged ions interacting with surfaces [13].…”

Section: Discussionmentioning

confidence: 99%

Surface spectroscopy of nano- and subnanostructures

et al. 1998

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In light of recent progress in the fabrication and diagnostics of nanostructures and surfaces, more advanced spectroscopic and imaging methods are necessary in order to elucidate the detailed structure, nature and creation of such microsystems. We present here one especially promising method, namely highly charged ion surface interaction using an electron beam ion trap (EBIT) facility. Specifically we focus on the microspectroscopy, nano-and subnanostructure modification of surfaces and generation of x-rays involving heavy highly charged ion-structure interaction. In this process a large amount of potential energy is deposited by single ions at the surface leading to localized surface defects of subnanosize. In particular, we present new results on highly charged Bi q+ (q = 50-71) ions interacting with gold surfaces. A detailed experimental and theoretical analysis is provided for the x-ray spectra from the gold surface. These data have been measured at the Lawrence Livermore National Laboratory EBIT highly charged ion facility. The comparison of our computer simulation with experimental x-ray spectra provides evidence for the formation of subsurface hollow atoms. A striking orbital (n) and angular momentum (l ) dependence for hollow atoms formation has been found shedding more light on the dynamics of complex ion-surface and ion-solid interaction processes. Finally, new developments in imaging on nano-and angstrom-scale using heavy highly charged ions are discussed.

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“…Investigation and quantification of surface nano structures are important for technological developments, such as multilayer reflection systems for application in the soft X-ray and extreme ultraviolet radiation regimes [1][2][3][4]. X-ray Photoemission Spectroscopy (XPS) provides the possibility for non-destructive analysis of surface structures [5][6][7].…”

Section: Introductionmentioning

confidence: 99%

“…In the last twenty years a numerical algorithm has been developed, which has been applied to study various surface nano-structures [18][19][20]. In this paper we study exemplarily multilayer systems consisting of Mo/Si stack [1] and a Ru cap layer [21] as used for soft X-ray reflection and other applications [2,3]. These multilayer mirrors (MLMs) often suffer from contamination [4] especially oxidation and carbon growth, which are of certain interest in our studies.…”

Section: Introductionmentioning

confidence: 99%

Factor analysis and advanced inelastic background analysis in XPS: Unraveling time dependent contamination growth on multilayers and thin films

Gusenleitner¹,

Hauschild²,

Graber³

et al. 2013

Surface Science

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In order to follow and understand time dependent contamination growth on multilayer mirrors for extreme ultraviolet (EUV) lithography applications, particular heterosystems were investigated with X-ray Photoemission Spectroscopy (XPS). Diverse capping layers can be used to terminate EUV multilayer mirrors to protect the underlying multilayer stack, e.g. Ru metal. In XPS problems were encountered when analyzing spectra as the core-level signals of Ru and C overlap. Further, Ru was not only present as pure metal, but also in its oxidized state. Disentangling the overlapping XPS spectra was achieved by application of factor analysis (FA) yielding not only the spectra of each component but also the according weights. Thus a model for the time dependent contamination growth was developed. This model was cross checked by advanced inelastic background analysis. Both methods displayed a way to unravel overlapping data sets and for deducing multilayer composition models.

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New Concepts for X-Ray, Soft X-Ray, and EUV Optical Instrumentation Including Applications in Spectroscopy, Plasma Diagnostics, and Biomedical Microscopy: A Status Report

Cited by 3 publications

References 0 publications

Wave optics treatment of x-rays passing through tapered capillary guides

Wave optics treatment of x-rays passing through tapered capillary guides

Surface spectroscopy of nano- and subnanostructures

Factor analysis and advanced inelastic background analysis in XPS: Unraveling time dependent contamination growth on multilayers and thin films

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