New Concepts in Projection Mask Aligners

Offner, Abe

doi:10.1117/12.7978742

Cited by 135 publications

(37 citation statements)

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“…Also, because of the finite size of the actual thermocouple junction, slow rise times, > lps, are characteristic. The results reported here use the system employed by and Zehnder and Kallivayalil (1991 (Offner, 1975) the Offner optical system offers the ability to correct the image for third and fifth order abberations. Although such accuracy may not be required due to the finite detector size, the system is quite simple to set up, and it offers some desirable features.…”

Section: Dynamic Crack Tip Temperature Fieldsmentioning

confidence: 99%

On the dependence of the dynamic crack tip temperature fields in metals upon crack tip velocity and material parameters

Mason

Rosakis

1993

Mechanics of Materials

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Section: Dynamic Crack Tip Temperature Fieldsmentioning

confidence: 99%

On the dependence of the dynamic crack tip temperature fields in metals upon crack tip velocity and material parameters

Mason

Rosakis

1993

Mechanics of Materials

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“…For a system with an odd number of reflections, real images will be produced, and the incident and reflected rays will be located on the opposite sides of the center. This is true for the Dyson system [4] and the Offner system [8] . By carefully analyzing the aberrations of the two-mirror three-reflection concentric system, we can determine that the convex mirror constitutes the aperture stop of the system.…”

mentioning

confidence: 97%

“…In 1973, Offner proposed a kind of two-mirror three-reflection concentric system [6,7] . The author pointed out that an annular field was present in this concentric system, which could be considered to have zero aberration because the fifth-order aberration could be balanced by the third-order aberration [8] . In 1987, Charls [9] analyzed the concentric optical system in detail and proved that the concentric optical system had the following characteristics.…”

mentioning

confidence: 99%

“…When µ is very small, h cos u ≈ h can be obtained, and the incident ray is approximately parallel to the emergent ray. Thus, the aberration is slight, and a thin annular field in the system exists, i.e., the so-called annular field with minimum aberration [8] . If R = 2r (h = 0), the telecentric optical system is formed because the stop is in the focal plane.…”

mentioning

confidence: 99%

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Non-approximate method for designing annular field of two-mirror concentric system

Huang¹,

Zhu²,

Li³

et al. 2012

中国光学快报

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Annular field aberrations of a three-reflection concentric system, which are composed of two spherical mirrors, are analyzed. An annular field with a high level of aberration correction exists near the position where the principal ray is perpendicular to the object-image plane. Aberrations are determined by the object height and aperture angle. In this letter, the general expression of the system aberration is derived using the geometric method, and the non-approximate design method is proposed to calculate the radii of the annular fields that have minimum aberrations under different aperture angles. The closer to 0.5 (the ratio of the radius of convex mirror to the radius of concave mirror) is, the smaller the system aberration is. The examples analyzed by LABVIEW indicate that the annular field designed by the proposed method has the smallest aberration in a given system. Concentric optical system is constituted by a series of refracting or reflecting spherical surfaces that have the same center and separated by homogeneous media. Any plane containing the optical axis is symmetrical, and any ray traversing through the spherical center is the axis of the rotational symmetry of the system. Therefore, this system can eliminate high-order aberrations, and consequently, it can be widely applied in a remote-sensing system [1,2] as well as in the large-scale integrated circuit manufacturing industry [3] . Generally, the concentric optical system can be divided into systems with a single mirror [4,5] , two mirrors, and three mirrors. In 1973, Offner proposed a kind of two-mirror three-reflection concentric system [6,7] . The author pointed out that an annular field was present in this concentric system, which could be considered to have zero aberration because the fifth-order aberration could be balanced by the third-order aberration [8] . In 1987, Charls [9] analyzed the concentric optical system in detail and proved that the concentric optical system had the following characteristics. Firstly, the product nd for any ray that traces such a system will maintain the same value throughout, where n is the refractive index of the space medium and d is the perpendicular distance of the ray from the spherical center of the space. Secondly, if the object and the image are in the air and the incident ray emerges as parallel, then the system will perform ideal imaging at a point located at the joint of the object and the system center. Thirdly, the distance of the incident and emergent rays from the center will be in the ratio of the object to the image space refractive indices. Fourthly, for a system consisting only of refracting surfaces or a system with an even number of reflections, the system will produce virtual images. The rays will be positioned on the same side of the system center. For a system with an odd number of reflections, real images will be produced, and the incident and reflected rays will be located on the opposite sides of the center. This is true for the Dyson system [4] and the Offner system [8] . By car...

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“…6,7 This catoptric system is completely achromatic since no refraction is involved. These properties made the Offner imaging system successfully utilized in the fields of optical lithography, 8 telescope, 9 and imaging spectrometer.…”

Section: Introductionmentioning

confidence: 99%

Rotatable Offner imaging system for ellipsometric measurement

Jin

Tanaka

Kondoh

et al. 2017

Review of Scientific Instruments

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To realize high spatial resolution imaging ellipsometric measurement with large field of view, we developed a rotatable Offner system with unit magnification. When the conventional Offner imaging system is tilted relative to the sample plane for the ellipsometric measurement, only a small region of plane is in focus. The rotatable Offner system developed here renders the entire object in focus through all rotations. The performance of the prototype of the Offner system and imaging ellipsometer is tested by generating maps of the ellipsometric parameters Δ and Ψ for samples such as a silicon wafer and a resolution target made of chromium film evaporated on a glass substrate.

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New Concepts in Projection Mask Aligners

Cited by 135 publications

References 0 publications

On the dependence of the dynamic crack tip temperature fields in metals upon crack tip velocity and material parameters

On the dependence of the dynamic crack tip temperature fields in metals upon crack tip velocity and material parameters

Non-approximate method for designing annular field of two-mirror concentric system

Rotatable Offner imaging system for ellipsometric measurement

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