New Developments in Resist Materials for the SCALPEL Technology

Abstract

A series of commercially viable positive and negative acting chemically amplified resists developed for 193 nm and 248 nm lithographies have been investigated for use in the SCALPEL technology. The investigation focused on determining the compatibility of these materials to the operating conditions and writing strategy of the exposure tool. The resist systems investigated included the deep-UV positive acting chemically amplified resist ARCH produced by Olin Microelectronics Materials (0MM), the negative acting material NEB 22A made available by Sumitomo and a 193 nm sensitive positive tone system being developed by Lucent and OMM. The extent to which these materials exhibited volatilization in the tool during exposure determined there compatibility. Those materials characterized by having a high activation energy for the acid catalyzed deprotection process and use of acid molecules which are stable at temperatures in the 40-50 °C range were viewed as compatible with the SCALPEL exposure system. For the resists investigated the sensitivity @ 100 KV ranged from 10-30 ii C/cm ` . 80-100 nm line and space pattern resolution was routinely observed and process latitude in excess of 20 % for features 0.20 u m was measured.

Technique for rapid at-wavelength inspection of extreme ultraviolet mask blanks

“…͑These reflectivity deficits are believed to be similar to the defects produced from FIB doses of 1ϫ10 14 , 6ϫ10 13 , and 3ϫ10 13 ions/cm 2 , respectively.͒ The parameter values used for this calculation were ␥ϭ10 and kϭ0.0036. 12 Except for the second height listed, these values agree well with the measured heights of 155, 90, and 50 Å. For the fourth defect, where the reflectivity is unknown, we can use the model to determine that the 265 Å tall mound of resist was probably caused by a reflectivity deficit of 16%.…”

Organic–Inorganic Nanocomposites: Unique Resists for Nanolithography

“…A series of commercially viable positive and negative CA resists developed for 248 and 193 nm are being investigated for SCALPEL (scattering with angular limitation projection electron lithography) [2,26,27] at Lucent Technologies. The resists include the DUV CA resist ARCH (Arch Chemicals), the negative material NEB 22A (Sumitomo), and a 193 nm sensitive positive-tone system developed by Lucent and Arch Chemicals.…”