New etching process for device fabrication using diamond

Hwang, D. S.; Saito, Takahiro; Fujimori, Naoji

doi:10.1016/j.diamond.2004.07.020

Cited by 66 publications

(33 citation statements)

References 8 publications

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“…The density of our DNRs is comparable the density achieved by applying the lithographic process [4,10]. It is believed that the realized nano-structures will find future applications in various fields like the realization of sensing material for electronic devices [5,12,13].…”

Section: Etching Of Diamondsupporting

confidence: 53%

“…In addition, several studies [5][6][7][8][9] present also interesting relations like dependence of the etch rate on the applied power and/or on the gas mixture, the influence of surface morphology and/or crystallogra-phy on the etch rate, etc. Ando et al have showed that a quite high etching ratio with a good result in smoothing of etched surface at high selectivity can be achieved in CF 4 /O 2 based gas mixture [10].…”

Section: Introductionmentioning

confidence: 99%

“…Instead of carbon nanotubes, which are produced by bottomup methods, the DNRs are typically produced by topdown methods [11]. However, they are also promising as a new type of (bio) sensors [4,5,12,13].…”

Section: Introductionmentioning

confidence: 99%

“…Due to a high mechanical strength and hardness, high thermal conductivity, thermal stability and chemical inertness, wide band gap and other outstanding properties, diamond has got a persistent attention as an excellent candidate for electronic, biological and microelectromechanical systems and sensing applications [1][2][3][4][5]. Several potential applications of diamond films require (nano)structuring where mostly plasma-assisted reactive ion etching (RIE) is used.…”

Section: Introductionmentioning

confidence: 99%

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Nanostructuring of diamond films using self-assembled nanoparticles

et al. 2009

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Abstract:We report the use of gold, nickel and diamond nanoparticles as a masking material for realization of diamond nano-structures by applying the dry plasma etching process. Applying low power plasma (100 W) in a gas mixture of CF 4 /O 2 for 5 minutes results in a formation of three different types of diamond nanostructures, depending on the mask type material and particle size. Using of the Ni mask results in realization of diamond nano-rods, applying of the Au mask brings cauliflower-like structures, and using the diamond powder allows the production of irregular nano-structures. The main advance of the presented etching procedure is use of a self-assembly strategy where no lithographic steps are implemented.

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Section: Etching Of Diamondsupporting

confidence: 53%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Nanostructuring of diamond films using self-assembled nanoparticles

et al. 2009

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“…According to this expansion, nowadays alternative substrates such as quartz [141], ceramics [147], plastics [148] and diamond [149,150] can also be used for fabricating MEMS, although still most MEMS devices are based on silicon as substrate. …”

Section: Introductionmentioning

confidence: 99%

Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes

Álvaro¹

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"Sí com lo taur se'n va fuyt pel desert quantés sobrat per son semblant qui·l força, ne torna may fins ha cobrada força per destruir aquell qui l'ha desert: tot enaxí·m cové lunyar de vós, car vostre gest mon esforç ha confús: no tornaré fins del tot haja fus la gran pahor qui·m toll ser delitós." Ausiàs March, 1397 - †1459 Per a Marc AgradecimientosSin duda, todo el trabajo que hay detrás de esta tesis ha sido posible gracias a la colaboración y dedicación de muchos. Todos ellos merecen ser agradecidos por haber contribuido a su manera en la culminación de este trabajo.Agradecer sinceramente a mis directores y tutores, Ximo Cerdà y Ricardo Colom, por permitir formarme como investigador y ofrecerme sus consejos. Ellos me han tratado con respeto y nunca han puesto freno a mis ambiciones, más bien las han engrandecido. Gracias por guiar toda esta aventura.Una mención muy especial se merecen MiguelÁngel Gosálvez y Néstor Ferrando. Les tengo que agradecer la gran suerte que he tenido de poder colaborar con dos eminencias como ellos. Sus grandes conocimientos han permitido obtener los mejores resultados de este trabajo, además de haber sido una experiencia gratificante. Gracias por su constante apoyo y su ayuda infinita.Asimismo, dar las gracias también a Vicente Herrero, Jose María Monzó, Ana Ros y Ramón J. Aliaga. Ellos dieron vida a un ambiente de trabajo idóneo, aportándome mucho más que ayuda y conocimientos. Del mismo modoÁngel Tébar, Rafael Gadea y Jorge Daniel siempre han estado dispuestos a ayudar en todo cuanto han podido.Mi estancia en el instituto Fraunhofer de Erlangen me ha permitido acelerar mi formación y vivir unas experiencias de lo más satisfactorias. Todo ello ha sido gracias a la magnífica gente con la que he tenido el placer de colaborar y convivir. Gracias a Eberhard Bär y a toda la incontable gente del Fraunhofer IISB.Un mérito especial se merecen mi familia y mis amigos por aguantarme todo este tiempo sin perder la paciencia conmigo ni en los peores momentos. Es de un valor incalculable tener tantos hombros en los que poder dejarte caer para coger las fuerzas suficientes para seguir. Gracias Isidor y Lourdes, gracias Ferran y Andreu, y gracias Vicente, Enric y David.iii No podía faltar mi particular aimia, Nuria.Ella se merece un eterno agradecimiento por haber tenido que vivir todo esto conmigo. Compañera de todas y cada una de las experiencias, buenas y malas, de esta larga aventura. Animándome en todo momento, siempre ayudándome con un altruismo deslumbrante y enseñándome una inmensidad de conocimientos. Ella, ha sido y es, mi llir entre cards.Una vez más, muchísimas gracias a todos. iv SummaryThe main topic of the present thesis is the improvement of fabrication processes simulation by means of the Level Set (LS) method. The LS is a mathematical approach used for evolving fronts according to a motion defined by certain laws. The main advantage of this method is that the front is embedded inside a higher dimensional function such that updating this function instead of directly the front it...

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DNA‐Modified Diamond Films

Yang

Nebel

2011

Synthetic Diamond Films

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New etching process for device fabrication using diamond

Cited by 66 publications

References 8 publications

Nanostructuring of diamond films using self-assembled nanoparticles

Nanostructuring of diamond films using self-assembled nanoparticles

Study, Modelling and Implementation of the Level Set Method Used in Micromachining Processes

DNA‐Modified Diamond Films

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