2001
DOI: 10.1117/12.435707
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New-generation projection optics for microlithography

Abstract: In order to meet the requirements ofthe Semiconductor industry, Canon has developed two new optical systems. First is an extension of KrF technology, with the introduction of high NAO.73 lens for KrF scanner that will cover the 130 nm device node. Second is the O.57NA optics for wide field (30 mm square) i-line stepper, to be used cost-effectively on Mix & Match modes. These new generation lenses behave very low aberration. Wavefront is accurately measured by PM! (Phase Measurement Interferometer). At each tun… Show more

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