1996
DOI: 10.1007/s0021663550826
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New hardware for radio frequency powered glow discharge spectroscopies and its capabilities for analytical applications

Abstract: A new radio frequency (rf) hardware is developed for glow discharge spectroscopic methods. The resulting features and its capabilities for analytical applications are discussed. The electrical equipment developed allows to work as quickly, stably, reliably and easily as known from the direct current (dc) mode. Moreover, the rf power measurement has been improved. The hardware has been developed, optimised and tested for glow discharge optical emission spectroscopy (GDOES), but nevertheless it is possible to us… Show more

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Cited by 46 publications
(35 citation statements)
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“…The chemical composition of the as-deposited and the annealed samples was determined by glow discharge optical spectrometry analysis [6,14] using a Leco SPD-750 surface depth profile emission spectrometer and an Ni 50 Mn 50 reference probe. The Ni concentration found in the films is between 48 and 52 at% and corresponds to the phase diagram region where formation of a stoichiometric Ni 50 Mn 50 phase is expected [15].…”
Section: Sample Characterizationmentioning
confidence: 99%
“…The chemical composition of the as-deposited and the annealed samples was determined by glow discharge optical spectrometry analysis [6,14] using a Leco SPD-750 surface depth profile emission spectrometer and an Ni 50 Mn 50 reference probe. The Ni concentration found in the films is between 48 and 52 at% and corresponds to the phase diagram region where formation of a stoichiometric Ni 50 Mn 50 phase is expected [15].…”
Section: Sample Characterizationmentioning
confidence: 99%
“…We used GDOES to clarify this point. Because of the non-conducting substrate, we applied our self-developed radiofrequency equipment, a new and very suitable device for studying vertical concentration variations [59]. For series B, the vertical homogeneity was also checked by monitoring the quotient of the Ni and Si evaporation rates during film deposition [55].…”
Section: A Compositionmentioning
confidence: 99%
“…The free-running generator (rf power supply) and the powermeter (rf power measurement) are described in detail in ref. [15].…”
Section: Methodsmentioning
confidence: 99%