New mask design approach for UV laser micromachining to reduce stitching errors

Abstract

This paper describes a new approach to mask design as well as a new pulsed laser micromachining strategy referred to as "Common Nest" (CN) to reduce stitching errors, need for programming offsets and alignment problems. The CN mask design approach breaks down a microchannel pattern shape into sub-feature shapes, which are related by a common origin. CN allows major improvements to be made in the accuracy, speed and efficiency with which complex microstructures can be created by laser ablation. The details and a CAD tool concept design for this method are presented. Experiments to evaluate this method and examples of Y-shape and serpentine microchannels machining are reported.

Surface-patterned electrode bioreactor for electrical stimulation

“…These masks are expensive, easily damaged, and susceptible to accidental application of laser fluence higher than the mask ablation threshold. 54 …”