2012
DOI: 10.1134/s0012500812010041
|View full text |Cite
|
Sign up to set email alerts
|

New polyphenols of the fluorene family and positive-tone photoresists based on them for 22-nm nanolithography

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
2
0

Year Published

2014
2014
2016
2016

Publication Types

Select...
5

Relationship

1
4

Authors

Journals

citations
Cited by 12 publications
(2 citation statements)
references
References 11 publications
0
2
0
Order By: Relevance
“…Methoxyphenyl derivative VIII thus prepared was subjected to demethylation by procedure [13] to give PEI with pendant phenolic hydroxyl groups (polymer IX). At last, final polymer Х was synthesized by the nucleophilic substitution reaction of the phe nolic hydroxyl groups with pentafluorostyrene (XI) [4] (Syn Quest Co., United States).…”
Section: Monomermentioning
confidence: 99%
See 1 more Smart Citation
“…Methoxyphenyl derivative VIII thus prepared was subjected to demethylation by procedure [13] to give PEI with pendant phenolic hydroxyl groups (polymer IX). At last, final polymer Х was synthesized by the nucleophilic substitution reaction of the phe nolic hydroxyl groups with pentafluorostyrene (XI) [4] (Syn Quest Co., United States).…”
Section: Monomermentioning
confidence: 99%
“…The prepared PEIs and their derivatives were iden tified by IR spectroscopy and 1 Н, 13 С, and 19 F NMR. The IR spectrum of initial PEI (η red = 0.47 dL/g, 0.5% solution in NMP, 25°С) shows absorption bands typi cal for five membered imide rings at 1790, 1722, 1377, and 730 cm -1 .…”
Section: Monomermentioning
confidence: 99%