New positive resists with cycloaliphatic structures in the main chain

Meyer, Ursula; Kern, Wolfgang; Hummel, Klaus; Stelzer, Franz

doi:10.1016/s0014-3057(98)00094-9

Cited by 9 publications

(8 citation statements)

References 9 publications

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“…Ring-opening metathesis polymerization (ROMP) has emerged as a powerful synthetic method for the creation of unique materials. Polymers generated by ROMP have a variety of applications in both the materials sciences, as liquid crystals, photoresists, specialty elastomers, components of superconductors and materials for solid-phase extraction [1][2][3][4], and in the biological sciences, as inhibitors of biological processes and tools for investigating multivalent interactions [5][6][7][8][9][10][11][12][13][14]. These applications have been made possible by advances in catalyst development and polymerization techniques that have provided methods to generate polymers of controlled length and defined structure [15][16][17].…”

Section: Introductionmentioning

confidence: 99%

Synthesis of end-labeled multivalent ligands for exploring cell-surface-receptor–ligand interactions

Gordon

Gestwicki

Strong

et al. 2000

Chemistry & Biology

127

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Ruthenium-initiated ROMP can be used to generate biologically active, multivalent ligands terminated with a latent functional group. The functionalized polymers can be labeled with a variety of molecular tags, including fluorescent molecules, biotin, lipids or antibodies. The ability to conjugate reporter groups to ROMP polymers using this strategy has broad applications in the material and biological sciences.

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Section: Introductionmentioning

confidence: 99%

Synthesis of end-labeled multivalent ligands for exploring cell-surface-receptor–ligand interactions

Gordon

Gestwicki

Strong

et al. 2000

Chemistry & Biology

127

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“…Acrylic polymers have methacrylate backbones and sufficient transparency at 193 nm and can serve as the basis for 193‐nm photoresists. However, the disadvantage of acrylic polymers is that they have poor dry‐etching resistance in the subsequent plasma steps because of the low carbon density of the polymer chains 9–13. Methacrylate polymers containing alicyclic hydrocarbons, which are introduced into the side chains, are being studied to improve dry‐etching resistance 14–16.…”

Section: Introductionmentioning

confidence: 99%

Synthesis and characterization of novel copolymers with acid‐labile ketal moieties derived from camphor

Liu

Wang

2003

J of Applied Polymer Sci

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Novel diastereomeric acrylic ketal monomers derived from (ϩ)-camphor and (Ϯ)-camphor were synthesized. To investigate the applications of the camphor derivatives on positive-tone photoresists, the acrylic ketal monomers were copolymerized with methyl methacrylate, methacrylic acid, and n-butyl methacrylate. The optical activities of the chiral monomers and polymers were all evaluated. After UV irradiation and postexposure baking, the optical activity of the polymers decreased because of the decomposition of the acid-labile pendant chiral groups. The existence of alicyclic camphyl groups increased the etching resistance of the photoresists. The thermogravimetric properties of the copolymers, the exposure curves, the lithographic evaluation of the positive-tone photoresists, and the effects of alicyclic groups on the plasma etching resistance of the copolymers were all investigated. A resolution of a lineand-space pattern of 0.3 m was achieved. Acid-catalyzed dehydration crosslinking was also found in this system. Sufficient UV irradiation and heat treatment could cause the acid-catalyzed dehydration crosslinking of pendant carboxyl groups and thereby increase the efficiency of the thermal resistance of the polymers.

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“…Positive photoresists are materials that become soluble in solvent or water‐based developing solutions when exposed to optical radiation. Many articles describing various mechanisms for positive‐tone photoresists have been published 1–7. Particularly, the t ‐butoxy carbonyl ( t ‐BOC) deprotection mechanism offering a high sensitivity and contrast by acid‐catalyzed deprotection has attracted interest in the development of high‐performance photoresist 8–9…”

Section: Introductionmentioning

confidence: 99%

Photocurable positive photoresist‐comprising copolymers having pendant alkoxy ethyl moieties

Liu

Shih

2001

J of Applied Polymer Sci

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A series of copolymers based on methacrylic acid (MAA), methyl methacrylate (MMA), n-butyl methacrylate (BM), and bornyl methacrylate (BMA) with various feed molar ratios were synthesized. To introduce the protecting alkoxy ethyl moieties onto copolymers, the pendant carboxyl groups were further reacted with alkyl vinyl ether. The pendant alkoxy ethyl groups on copolymers could be deprotected by acid catalyst. Characterization of positive-tone photoresist-comprising copolymers having pendant alkoxy ethyl groups was carried out. Effects of alicyclic bornyl groups on the sensitivity and thermal properties of copolymers were investigated. It was found that the existence of bornyl groups in polymer might interfere with the hydrogen bonding produced by pendant carboxyl groups, leading to the decrease of thermal resistance. Acid-catalyzed dehydration crosslinking of pendant carboxyl groups of copolymers was also investigated. The exposure characteristic curves and the lithographic evaluation of the positive-tone photoresist were all investigated. Effects of alicyclic bornyl groups on the plasma etching resist of copolymers were also evaluated.

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New positive resists with cycloaliphatic structures in the main chain

Cited by 9 publications

References 9 publications

Synthesis of end-labeled multivalent ligands for exploring cell-surface-receptor–ligand interactions

Synthesis of end-labeled multivalent ligands for exploring cell-surface-receptor–ligand interactions

Synthesis and characterization of novel copolymers with acid‐labile ketal moieties derived from camphor

Photocurable positive photoresist‐comprising copolymers having pendant alkoxy ethyl moieties

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