2023
DOI: 10.1016/j.ijmachtools.2023.104006
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New precision electroforming process for the simultaneous improvement of thickness uniformity and microstructure homogeneity of wafer-scale nanotwinned copper arrays

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Cited by 8 publications
(2 citation statements)
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“…A pure Ni (99.5%) mould as shown above in Fig. 2 was manufactured using dry etching, electroforming, and moulding based on silicon lithography [ 41 ] and electroforming [ 42 ]. Two design features were patterned on 4-inch silicon wafers using ultraviolet lithography, deep reactive ion etching (DRIE), followed by a conductive layer of titanium (50 nm) and nickel vanadium (200 nm), which was electroformed and then etched in a solution of potassium hydroxide (KOH).…”
Section: Methodsmentioning
confidence: 99%
“…A pure Ni (99.5%) mould as shown above in Fig. 2 was manufactured using dry etching, electroforming, and moulding based on silicon lithography [ 41 ] and electroforming [ 42 ]. Two design features were patterned on 4-inch silicon wafers using ultraviolet lithography, deep reactive ion etching (DRIE), followed by a conductive layer of titanium (50 nm) and nickel vanadium (200 nm), which was electroformed and then etched in a solution of potassium hydroxide (KOH).…”
Section: Methodsmentioning
confidence: 99%
“…This ensured that the microstructures were distributed equally across all layers on the wafer, while also minimizing the detrimental impact of current redistribution on individual thickness uniformity. 45 Li et al investigated the effects of two different processing methods, PC and PRC, on the microstructure and nanomechanical characteristics of nickel micro-pillars. According to their results, the PC technique produced an uneven microstructure with bigger columnar grains and numerous nanocrystals, as seen in Fig.…”
Section: Advancement In Micro-electroformingmentioning
confidence: 99%