New process for synthesis of nickel oxide thin films and their characterization

Raut, B. T.; Pawar, S. G.; Chougule, M. A.; Sen, Shashwati; Patil, V. B.

doi:10.1016/j.jallcom.2011.06.029

Cited by 42 publications

(27 citation statements)

References 27 publications

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“…The direct optical band gaps were found to be 3.97, 3.95, 3.90 and 3.88 eV for samples B0, B1, B2 and B3, respectively. The band gap values obtained in this investigation closely match with the values reported in the literature [11,13,15]. In addition, the band gap value decreases with increasing film thickness due to increase in grain size.…”

Section: Rbs Analysissupporting

confidence: 89%

“…On the other hand, transition metal oxides semiconducting materials such as MoO 3 , WO 3 and NiO have great potential application in microelectronics and optoelectronics [4][5][6][7][8][9][10][11][12][13][14][15]. Among them, nickel oxide (NiO) has specific properties and diverse applications.…”

Section: Introductionmentioning

confidence: 99%

“…Among them, nickel oxide (NiO) has specific properties and diverse applications. The properties of NiO thin films which make it suitable for the different applications are excellent durability, low material cost, wide optical band gap, excellent electrical and optical properties [7][8][9][10][11][12][13]. NiO thin films can be applied in electrochromic display devices, gas sensors, positive electrode in Li-ion batteries [5][6][7][8][9][10].…”

Section: Introductionmentioning

confidence: 99%

“…NiO thin films can be applied in electrochromic display devices, gas sensors, positive electrode in Li-ion batteries [5][6][7][8][9][10]. Several techniques have been used to prepare NiO thin films, including pulsed laser deposition [5], plasma oxidation [7], DC and RF magnetron sputtering [8][9][10][11][12], sol-gel [13,14] and so on. In addition to these preparation methods, NiO films can also be prepared by thermal oxidation of nickel film [16].…”

Section: Introductionmentioning

confidence: 99%

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Structural, electrical, and decorative properties of sputtered zirconium thin films during post-annealing process

2013

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Silver (Ag) nanolayers were deposited on nickel oxide (NiO) thin films by DC magnetron sputtering. The thickness of Ag layers was in range of 20-80 nm by variation of deposition time between 10 and 40 s. X-ray diffraction results showed that the crystalline properties of the Ag/NiO films improved by increasing the Ag film thickness. Also, atomic force microscopy and field emission scanning electron microscopy images demonstrated that the surface morphology of the films was highly affected by film thickness. The film thickness and the size of particles change by elevating the Ag deposition times. The composition of films was determined by Rutherford back scattering spectroscopy. The transmission of light was gradually reduced by augmentation of Ag films thickness. Furthermore; the optical band gap of the films was also calculated from the transmittance spectra.

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Section: Rbs Analysissupporting

confidence: 89%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Structural, electrical, and decorative properties of sputtered zirconium thin films during post-annealing process

2013

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“…NiO is an important antiferromagnetic p-type of semiconductor and is a promising candidature for many applications such as lithium ion batteries, solar cells, antiferromagnetic layer, electrochemical capacitors, chemical sensors, and electrochromic coatings [1]. Stoichiometric NiO at R.T is an insulator with a resistivity of 10 13 Ω cm.The electrical conductivity of NiO can be manipulated by changing the concentration of Ni ion during doping [2].…”

Section: Introductionmentioning

confidence: 99%

Effect of Zn Doping on Structural and some Optical Studies of Nano NiO Films Prepared by Sol-Gel Technique

Hashim

Sami

2015

ILCPA

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ABSTACT. This research deals with the study of the structural andoptical properties of NiO and Zn doped NiO nano films with different ratios (0.01,0.05,0. 1mol %). NiO nano films in thickness 100nm were deposited on a glass substrate using sol-gel spin coating technique. XRD results indicated that the films are polycrystalline and have cubic structure with a preferred orientation along (111). The average grain sizes of the crystallites estimated from XRD data was found to lie in the range of 19. 11 -25.05 nm. Data of AFM indicate that the surface of films is smooth.The optical transmittance value of nano NiO film reaches to 94% in the VIS and NIR regions, while it is value of films deposited with 0.1mol%Zn reaches to (91)% which is important for its applications as window layers in solar cells. The values of optical energy gap of NiO and Zn doping by 0.01,0.05,and 0. 1 mol % were equal to 3.73, and 3.58,3.42, 3.41 eV respectively.

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Nickel oxide/expanded graphite nanocomposite electrodes for supercapacitor application

Cao

et al. 2012

J Solid State Electrochem

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New process for synthesis of nickel oxide thin films and their characterization

Cited by 42 publications

References 27 publications

Structural, electrical, and decorative properties of sputtered zirconium thin films during post-annealing process

Structural, electrical, and decorative properties of sputtered zirconium thin films during post-annealing process

Effect of Zn Doping on Structural and some Optical Studies of Nano NiO Films Prepared by Sol-Gel Technique

Nickel oxide/expanded graphite nanocomposite electrodes for supercapacitor application

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