2014
DOI: 10.1007/s11664-014-2978-8
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New Simulation Method to Characterize the Recoverable Component of Dynamic Negative-Bias Temperature Instability in p-Channel Metal–Oxide–Semiconductor Field-Effect Transistors

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Cited by 4 publications
(1 citation statement)
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“…Furthermore, the threshold voltage causes a negative drift because of fixed charge and interface states caused by a positive hole capture. A reactiondiffusion model was well explained by Wenping Wang [43], including the principle of the NBTI effect, which reported the breaking of the Si-H bond in the Si-SiO 2 interface into interface traps [44,45]. It was shown that these findings support this work due to frequency variations that were caused by the HCI and NBTI degradations.…”
Section: Lifetime Reliability At the Transistor Levelsupporting
confidence: 68%
“…Furthermore, the threshold voltage causes a negative drift because of fixed charge and interface states caused by a positive hole capture. A reactiondiffusion model was well explained by Wenping Wang [43], including the principle of the NBTI effect, which reported the breaking of the Si-H bond in the Si-SiO 2 interface into interface traps [44,45]. It was shown that these findings support this work due to frequency variations that were caused by the HCI and NBTI degradations.…”
Section: Lifetime Reliability At the Transistor Levelsupporting
confidence: 68%