New Tungsten(VI) Guanidinato Complexes: Synthesis, Characterization, and Application in Metal—Organic Chemical Vapor Deposition of Tungsten Nitride Thin Films.

Abstract

Films. -As revealed by single crystal XRD compound (IV) crystallizes in the space group C2/c with Z = 1 and compound (IV) in the space group P21/n with Z = 4. Compounds (V) and (VI) yield amorphous films of carbon-rich β-WNxCy and β-W2N in the absence of NH3. Thus (V) and (VI) behave as poor single-source precursors. However, when NH 3 is used as a coreactant gas in the MOCVD process, both compounds yield crystalline tungsten nitride films. (V) yields a film with much less carbon contamination (2 at.%) than compound (VI) (11 at.%). -(RISCHE, D.; PARALA, H.; GEMEL, E.; WINTER, M.; FISCHER*, R. A.; Chem.