Direct
drawing techniques have contributed to the ease of patterning
soft electronic materials, which are the building blocks of analog
and digital integrated circuits. In parallel with the printing of
semiconductors and electrodes, selective deposition of gate insulators
(GI) is an equally important factor in simplifying the fabrication
of integrated devices, such as NAND and NOR gates, and memory devices.
This study demonstrates the fabrication of six types of printed GI
layers (high/low-k polymer and organic–inorganic
hybrid material), which are utilized as GIs in organic field-effect
transistors (OFETs), using the electrostatic-force-assisted dispensing
printing technique. The selective printing of GIs on the gate electrodes
enables us to develop practical integrated devices that go beyond
unit OFET devices, exhibiting robust switching performances, non-destructive
operations, and high gain values. Moreover, the flexible integrated
devices fabricated using this technique exhibit excellent operational
behavior. Therefore, this facile fabrication technique can pave a
new path for the production of practical integrated device arrays
for next-generation devices.