Next-generation DPP EUV light source to support the HVM lithography ecosystem

Abstract

Energetiq Technology's existing EQ-10 Electrodeless Z-Pinch™ EUV light source uses xenon plasma to produce 13.5 nm (±1% BW) radiation with an EUV power of ~20W / 2pi. The source has been widely used for mask and optics inspection as well as resist development in both semiconductor production and research applications. Energetiq is introducing its next-generation EUV source, the EQS-10, which produces an EUV power of > 40W / 2pi. The EQS-10 contains new technologies which have been developed and patented, mainly solid-state switching, direct fueling, and adjustable preionization.