2012
DOI: 10.1007/978-3-642-23369-2
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Next Generation of Photovoltaics

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Cited by 35 publications
(6 citation statements)
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“…Although MJPV cells have the highest efficiency in respect of the solar concentration, the market demand for them is not high due to their high production cost and to MJPV constituents being less available. MJPV cells are currently economically feasible only if the concentration ratio is sufficient to minimize the cell area and offset its initial cost [102].…”
Section: Economic Aspects For High Concentration Ratio Cpvtsmentioning
confidence: 99%
“…Although MJPV cells have the highest efficiency in respect of the solar concentration, the market demand for them is not high due to their high production cost and to MJPV constituents being less available. MJPV cells are currently economically feasible only if the concentration ratio is sufficient to minimize the cell area and offset its initial cost [102].…”
Section: Economic Aspects For High Concentration Ratio Cpvtsmentioning
confidence: 99%
“…Different MJSCs coupled with CPV system exhibits an increase in the cell efficiency of up to 1000 suns, and then the cell efficiency drops due to the internal resistive losses. 45 Since the range in this study is between 2000 and 10 000 suns, the state-of-thearts MJSC not efficiently compatible to safely operate and produce a high-power output under ultrahigh GC. Thus, this study relies on future solar cell architectures (vertical-tunnel-junction [VTJ]) which can uphold the cell at an efficiency of 28.4% at 15 000 suns with no degradation.…”
Section: Assumptions and Boundary Conditionsmentioning
confidence: 93%
“…Despite the fact that from a theoretical point of view, the principle of operation of IBSC-type cells has been comprehensively described in [18], the problem of practical implementation of this concept in the form of a semiconductor material with an intermediate energy bandwidth, ensuring effective conversion of solar energy into electricity, still remains valid. Therefore, the mechanism of the formation of intermediate bands in semiconductors, as well as its utilitarian aspects, is the subject of many research papers, including a few selected current research directions based on the use of ion implantation [19][20][21][22][23][24][25]. One of them is an approach that includes the use of ion implantation to introduce dopants of very high concentration into the semiconductor substrate [25] or subjecting the silicon layer to implantation with metal ions of very high doses [20,23].…”
Section: Current Research Directions Using Ion Implantationmentioning
confidence: 99%
“…Therefore, the mechanism of the formation of intermediate bands in semiconductors, as well as its utilitarian aspects, is the subject of many research papers, including a few selected current research directions based on the use of ion implantation [19][20][21][22][23][24][25]. One of them is an approach that includes the use of ion implantation to introduce dopants of very high concentration into the semiconductor substrate [25] or subjecting the silicon layer to implantation with metal ions of very high doses [20,23].…”
Section: Current Research Directions Using Ion Implantationmentioning
confidence: 99%