Ni induced few-layer graphene growth at low temperature by pulsed laser deposition

Abstract

We have used pulsed laser deposition to fabricate graphene on catalytic nickel thin film at reduced temperature of 650 °C. Non-destructive micro-Raman spectroscopic study on our samples, measuring 1x1 cm2 each, has revealed few-layer graphene formation. Bi-, tri-, and few-layer graphene growth has been verified by High Resolution Transmission Electron Microscopy. Our experimental results imply that the number of graphene layers formation relies on film thickness ratios of C to Ni, which can be well controlled by varying the laser ablation time. This simple and low temperature synthesizing method is excellent for graphene based nanotechnology research and device fabrication

Study on Graphene Thin Films Grown on Single Crystal Sapphire Substrates Without a Catalytic Metal Using Pulsed Laser Deposition

“…One advantage of PLD is that transcription processes, which is a problem with CVD, can be eliminated, and a graphene thin film can be prepared without a catalytic metal. Graphene growth by PLD was confirmed to have a close relationship with temperature [13][14][15].…”

Interface Characterization and Control of 2D Materials and Heterostructures

“…Instead of using thermal evaporators, target materials are deposited using intense laser ablation in the process of PLD. Recently, this technique has been used to produce numerous 2D materials including graphene, hBN, MoS 2 , InSe, and BP . The advantage of PLD lies in its high deposition rate and direct transfer of the stoichiometry of the target material.…”

Ångström-Scale, Atomically Thin 2D Materials for Corrosion Mitigation and Passivation

“…Conversely, contrary to theoretical predictions, Stone-Wales defects have not been found experimentally in hBN [114][115][116][117]. Various 2D material preparation techniques have been developed, which can be classified generally into two categories: top-down techniques (i.e., exfoliation via mechanical [19,[93][94][95], liquid [96,97] or chemical [98,99] means, electro-ablation [100]), and bottom-up techniques (i.e., atomic layer deposition (ALD) [101,102], pulsed laser deposition (PLD) [103,104], chemical vapor deposition (CVD) [105,106]). Typically, exfoliation generates 2D material flakes with small lateral sizes and poor dimensional control.…”