Nickel Thin Films Grown by MOCVD Using Ni(dmg)₂ as Precursor

Abstract

The aim of this study was (i) to investigate alternatives to the very toxic Ni(C0)4, (ii) optimization of the parameters for Ni film growth, and (iii) characterization of the film morphology. The thermal behaviour of the precursors bis(dirnethylglyoximato)Ni(II), [Ni(dmg)2], bis(2,2,6,6-tetramethyl-3,5-heptandionato)Ni(II), [Ni(thd)2], N,N'-ethylenebis(2,4-pentandioniminoato)Ni(II), [Ni(enacac)], and bis(2-amino-pent-2-en-4-onato)Ni(II), [Ni(apo)2] were investigated in a model reactor. Furthermore, the evaporation rates of these compounds were determined. Metallic nickel films were obtained using Ni(drng)2 as precursor. The deposition was canied out in a horizontal quartz reactor at reduced pressure in a hydrogen/helium atmosphere. The films were analysed by profilometry, X-ray diffraction, atomic force microscopy (AFM), fourpoint resistivity measurements and electron spectroscopy for chemical analysis (ESCA). Comparison of the AFM and ESCA data with the electrical resistances resulted in a two layer film model.

Theoretical study of the strong intramolecular hydrogen bond and metal–ligand interactions in group 10 (Ni, Pd, Pt) bis(dimethylglyoximato) complexes

“…Dissolving the precipitates in appropriate solvents makes also a spectrophotometric determination of the metal ions possible [3]. More recent application of the complexes appeared as precursors for deposition of thin metal films by MOCVD [4][5][6]. The complexes are also promising candidates for third-order non-linear optical materials [7][8][9][10][11][12].…”

Characterization and Evaluation of Standard Enthalpy of Vaporization and Kinetic Studies of Volatile bis(<i>N</i>-ethyl-5-methyl-salicylaldimine)nickel(II) Complex

“…Therefore, an alternative precursor is strongly required. Until now, several Ni precursors such as a glyoximato [7], β-diketonato [8], or cyclopentadienyl nickel [9] [10] were utilized as an alternative. All of them are solids below 150˚C, and their volatilities are far lower than that of Ni(CO) 4 .…”

Volatile CVD precursor for Ni film: cyclopentadienylallylnickel

“…Therefore, an alternative precursor is strongly required. Until now, several Ni precursors such as a glyoximato [8], b-diketonato [9], or cyclopentadienyl nickel [10,11] were utilized as an alternative. All of them are solids below 150 1C, and their volatilities are far lower than that of Ni(CO) 4 .…”