2016
DOI: 10.1007/s40830-016-0080-1
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NiMnGa/Si Shape Memory Bimorph Nanoactuation

Abstract: The size dependences of thermal bimorph and shape memory effect of nanoscale shape memory alloy (SMA)/Si bimorph actuators are investigated in situ in a scanning electron microscope and by finite element simulations. By combining silicon nanomachining and magnetron sputtering, freestanding NiMnGa/Si bimorph cantilever structures with film/substrate thickness of 200/250 nm and decreasing lateral dimensions are fabricated. Electrical resistance and mechanical beam bending tests upon direct Joule heating demonstr… Show more

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Cited by 14 publications
(4 citation statements)
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“…Thin films, epitaxially grown on a substrate, exhibit many more constrains from the substrate that result into difficulties for them to show uniform deformations. Nonetheless, they are promising candidates, especially in cantilever or free-standing form, for their implementation in different industrial applications, such as Micro-Electro-Mechanical Systems (MEMS) and Micro-Magneto-Mechanical Systems (MMMS) [13,28,29].…”
Section: Magnetic Shape Memory Alloys Msmasmentioning
confidence: 99%
“…Thin films, epitaxially grown on a substrate, exhibit many more constrains from the substrate that result into difficulties for them to show uniform deformations. Nonetheless, they are promising candidates, especially in cantilever or free-standing form, for their implementation in different industrial applications, such as Micro-Electro-Mechanical Systems (MEMS) and Micro-Magneto-Mechanical Systems (MMMS) [13,28,29].…”
Section: Magnetic Shape Memory Alloys Msmasmentioning
confidence: 99%
“…Thin film technology of the FSMAs has been under intense development and research during last decade (see Ref. and references therein) to explore a potential of these films for actuation and caloric applications on the micro(nano)scale.…”
Section: Anhysteretic Behavior Of Ferromagnetic Sma Films and Nanobeamsmentioning
confidence: 99%
“…Different pioneering works have been dedicated in down-scaling MSM Heuslers using several bottom-up and top-down approaches [16][17][18]. Specifically, starting from thin films of MSM Heuslers, the down-scaling approaches have been limited to nanosphere-lithography [15], photolithography [13,19,20], electron-beam lithography [6,[21][22][23][24][25][26] and focused ion-beam milling techniques [27,28].…”
Section: Introductionmentioning
confidence: 99%