In an effort to support
the large-scale implementation of clean
hydrogen in industry and society, the electrolytic decomposition of
water is considered a realistically enticing prospect, provided the
guarantee of affordable and durable material components. Within alkaline
systems, earth-abundant electrocatalysts could provide both these
requirements. However, a continued exploration of the reactivity and
the causes behind different behaviors in performance are necessary
to guide optimization and design. In this paper, Ta-doped NiO thin
films are prepared via DC magnetron sputtering (1–2–4
at % Ta) to demonstrate the effect of surface electronic modulation
by non-3d elements on the catalysis of the oxygen evolution reaction
(OER). Material properties of the catalysts are analyzed via Rutherford
backscattering spectrometry, X-ray diffractometry, photoelectron spectroscopy,
and Raman spectroscopy. Ta impurities are shown to be directly responsible
for increasing the valence state of Ni sites and enhancing reaction
kinetics, resulting in performance improvements of up to 64 mV at
10 mA cm
–2
relative to pristine NiO. Particularly,
we show that by applying
operando
Raman spectroscopy,
Ta enhances the ability to create high-valence Ni in γ-NiOOH
at a lower overpotential compared to the undoped sample. The lowered
overpotentials of the OER can thus be attributed to the energetically
less hindered advent of the creation of γ-NiOOH species on the
pre-catalyst surface: a phenomenon otherwise unresolved through simple
voltammetry.