Nitrogen doping and structural properties of amorphous carbon films deposited by pulsed laser ablation

Effects of methane gas flow rate on the optoelectrical properties of nitrogenated carbon thin films grown by surface wave microwave plasma chemical vapor deposition

“…This indicates the bonding state of diamond-like sp 3 -bonding and graphite-like trihedral sp 2 -bonding of this a-C:N films is unchanged. The presence of oxygen is probably related to the incorporation of oxygen due to prolonged exposure of the samples to the experimental atmosphere before XPS measurements and accidental incorporation during deposition [21].…”

Characterization of nitrogenated amorphous carbon thin films grown by microwave surface wave plasma CVD

“…This technique is one of the most likely used techniques in the literatures to characterize the chemical bonding structure and to acquire useful information on the chemical environment around oxygen, carbon and N of a-C:N phases [11,12]. Fig.…”

Effect of methane gas on the properties of nitrogenated amorphous carbon films grown by surface wave microwave plasma CVD

“…3 and 4 show the core level XPS spectra indicates the C 1s peak position for the a-C:P film deposited Table 1 The deposition rates, surface roughness and nitrogen contents of the a-C:N films as a function of CH 4 3 -bonding and graphite-like trihedral sp 2 -bonding of this a-C:N films is unchanged. The presence of oxygen is probably related to the incorporation of oxygen due to prolonged exposure of the samples to the experimental atmosphere before XPS measurements and accidental incorporation during deposition [21]. The chemical composition of the deposited films can be obtained according to the N to C atomic ratio (N/C).…”