2017
DOI: 10.3390/coatings7060079
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Nitrogen Trapping Ability of Hydrogen-Induced Vacancy and the Effect on the Formation of AlN in Aluminum

Abstract: This paper presents the ternary interaction of N, H, and vacancy point defects and the nitrogen trapping ability of aluminum vacancies induced by hydrogen by means of DFT methods employed in VASP (Vienna Ab initio Simulation Package) and Abinit packages. The obtained vacancy formation energy of 0.65 eV is close to experimental values. Although the N-vacancy complex is unstable with the negative binding energy of −0.51 eV, the stability of H-vacancy-N is proved by the positive binding energy of 0.59 eV and the … Show more

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Cited by 3 publications
(2 citation statements)
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“…with H sp Vac , S sp Vac , H sp Bulk and S sp Bulk the enthalpy and entropy of the supercell of a perfect crystal with and without a vacancy, respectively. The obtained formation enthalpy H f Vac is equal to 0.64 eV, in agreement with the literature [38,63,64]. In previous work, Naghavi et al have shown how the self diffusion coefficient of Cobalt is impacted by modifying S f Vac [60].…”
Section: Atomic Scale Modelling Of Hydrogen Consequences On the Diffu...supporting
confidence: 89%
“…with H sp Vac , S sp Vac , H sp Bulk and S sp Bulk the enthalpy and entropy of the supercell of a perfect crystal with and without a vacancy, respectively. The obtained formation enthalpy H f Vac is equal to 0.64 eV, in agreement with the literature [38,63,64]. In previous work, Naghavi et al have shown how the self diffusion coefficient of Cobalt is impacted by modifying S f Vac [60].…”
Section: Atomic Scale Modelling Of Hydrogen Consequences On the Diffu...supporting
confidence: 89%
“…The interaction between small molecules and metal surface is crucial in applied researches such as interfacial catalysis, anisotropic synthesis, anti-corrosion, and so forth [1]. For example, the interfacial reactions involving H 2 O is significantly affected by the adsorption of H 2 O molecules on the metal surface [2,3].…”
Section: Introductionmentioning
confidence: 99%