Nm-scale spatial resolution X-ray imaging with MLL nanofocusing optics: Instrumentational requirements and challenges

Nazaretski, Evgeny; Lauer, Kenneth; Huang, Xiaojing; Xu, Weihe; Kalbfleisch, Sebastian; Yan, Hui; Li, Li; Bouet, Nathalie; Zhou, Juan; Shu, Deming; Conley, Ray; Chu, Yong S.

doi:10.1063/1.4961143

Cited by 4 publications

(3 citation statements)

References 17 publications

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“…The coherent illumination was selected by a second source aperture placed about 15 m in front of the nano-focusing optics. The optics and microscope system to generate such a focus and perform scanning probe measurement are described elsewhere [4,8,32,33]. The sample used in the experiment contained gold nanoparticles, prepared by depositing a 20 nm thick layer of gold film onto a silicon substrate and then annealing the film at 800 • C for 8 hours.…”

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confidence: 99%

Artifact mitigation of ptychography integrated with on-the-fly scanning probe microscopy

Huang

Yan

et al. 2017

Applied Physics Letters

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We report our experiences with conducting ptychography simultaneously with Xray fluorescence measurement using the on-the-fly mode for efficient multi-modality imaging. We demonstrate that the periodic artifact inherent to the raster scan pattern can be mitigated using a sufficiently fine scan step size to provide an overlap ratio > 70%. This allows us to obtain transmitted absorption and phase contrast images with enhanced spatial resolution from ptychography while maintaining the fluorescence imaging with continuous-motion scans on pixelated grids. This capability will greatly improve the competence and throughput of scanning probe X-ray microscopy. Scanning probe X-ray microscopy is a powerful imaging method that simultaneously evokes multiple contrast mechanisms, including absorption, phase, fluorescence, diffraction and spectroscopy. These signals carry versatile information, and enable a suite of analytical tools to reveal a comprehensive view of the specimen under study. Correlative imaging using multiple contrast mechanisms simultaneously can significantly leverage the information obtained in the images. With the steady progress on fabricating high-resolution X-ray optics [1-5] and developing advanced microscopes [6-8], the achievable spatial resolution and detection sensitivity is continuously improving. Ptychography [9], as a scanning version of coherent diffraction imaging method, shares almost the same data acquisition scheme as a typical scanning probe microscope measurement, such as scanning X-ray transmission microscope (STXM) [10]. By scanning the specimen across a confined illumination

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confidence: 99%

Artifact mitigation of ptychography integrated with on-the-fly scanning probe microscopy

Huang

Yan

et al. 2017

Applied Physics Letters

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“…In [16] the working distance is 0.8 mm at an X-ray energy of 12 keV. It has to be noted, that both groups use lenses with a larger numerical aperture with roughly similar or smaller physical apertures.…”

Section: Jinst 13 C04011mentioning

confidence: 99%

Sub 25 nm focusing with a long working distance using multilayer Laue lenses

et al. 2018

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We report on recent results of focusing experiments with monolithic assembled multilayer Laue lenses (MLLs) at ESRF ID13 with a focal length of 9.5 mm at an X-ray photon energy of 12.7 keV. Using an aperture of approximately 40 µm we have achieved a size of the focal profiles of less than 25 nm in horizontal and vertical direction with a physical working distance of approximately 2.5 mm. The current MLL mounting approach is aiming for the reduction of the physical distance of the two crossed lenses. Assuming an identical focal length of both ideally the downstream surface to downstream surface distance of the lenses should be smaller than the depth of focus. This would avoid the otherwise necessary matching of the focal lengths and significantly reduce the alignment complexity of an MLL pair. K: Beam Optics; Beam-line instrumentation (beam position and profile monitors; beamintensity monitors; bunch length monitors) 1Corresponding author.

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“…The detail about the method and the experiment setup can be found elsewhere [7,21]. A coherent and monochromatic beam at 14.6 keV was shaped to 6×40 µm 2 by beam-defining slits to illuminate the desired MLL region.…”

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Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens

et al. 2015

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We report on the fabrication and the characterization of a wedged multilayer Laue lens for x-ray nanofocusing. The lens was fabricated using a sputtering deposition technique, in which a specially designed mask was employed to introduce a thickness gradient in the lateral direction of the multilayer. X-ray characterization shows an efficiency of 27% and a focus size of 26 nm at 14.6 keV, in a good agreement with theoretical calculations. These results indicate that the desired wedging is achieved in the fabricated structure. We anticipate that continuous development on wedged MLLs will advance x-ray nanofocusing optics to new frontiers and enrich capabilities and opportunities for hard X-ray microscopy.

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Nm-scale spatial resolution X-ray imaging with MLL nanofocusing optics: Instrumentational requirements and challenges

Cited by 4 publications

References 17 publications

Artifact mitigation of ptychography integrated with on-the-fly scanning probe microscopy

Artifact mitigation of ptychography integrated with on-the-fly scanning probe microscopy

Sub 25 nm focusing with a long working distance using multilayer Laue lenses

Achieving hard X-ray nanofocusing using a wedged multilayer Laue lens

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