2001
DOI: 10.1023/a:1004157128875
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Cited by 4 publications
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“…[12][13][14][15][16][17][18][19] N 2 -H 2 plasmas have also been applied to prepare III-V and nitride IV semiconductors and to the chemical synthesis of NH 3 . 10,17,[20][21][22][23][24][25][26][27][28][29][30][31][32][33][34][35] Similarly to other plasma processes, it is worthwhile investigating the chemical species in the gas phase of the plasma using various plasma diagnostic methods. Until now, the most frequently used plasma-diagnostics method for N 2 plasmas has been optical emission, which gives us information on excited molecules, radicals, atoms, and ions.…”
Section: Introductionmentioning
confidence: 99%
“…[12][13][14][15][16][17][18][19] N 2 -H 2 plasmas have also been applied to prepare III-V and nitride IV semiconductors and to the chemical synthesis of NH 3 . 10,17,[20][21][22][23][24][25][26][27][28][29][30][31][32][33][34][35] Similarly to other plasma processes, it is worthwhile investigating the chemical species in the gas phase of the plasma using various plasma diagnostic methods. Until now, the most frequently used plasma-diagnostics method for N 2 plasmas has been optical emission, which gives us information on excited molecules, radicals, atoms, and ions.…”
Section: Introductionmentioning
confidence: 99%
“…This method also produced organic by‐products 7,8. Other methods of producing VN thin films include: N 2 /H 2 plasma processing,9 ion beam assisted deposition,10 magnetron sputtering,11 molecular organic CVD,12 and pulsed laser deposition 13…”
Section: Introductionmentioning
confidence: 99%
“…15 atom%) was found in the films. Vanadium nitride films have also been grown by other techniques such as N 2 /H 2 plasma processing, 11 ion beam assisted deposition, 12 magneton sputtering, 13 molecular organic CVD 14 and pulsed laser deposition. 15 In most nitride CVD the incorporation of oxygen in the films either from the substrate or processes gases has proved problematic.…”
Section: Introductionmentioning
confidence: 99%